Invention Grant
- Patent Title: In-line metrology system
- Patent Title (中): 在线计量系统
-
Application No.: US14072406Application Date: 2013-11-05
-
Publication No.: US09123584B2Publication Date: 2015-09-01
- Inventor: Arnold Allenic , Stephan Paul George, II , Sreenivas Jayaraman , Oleh Petro Karpenko , Chong Lim
- Applicant: FIRST SOLAR, INC.
- Applicant Address: US OH Perrysburg
- Assignee: FIRST SOLAR, INC
- Current Assignee: FIRST SOLAR, INC
- Current Assignee Address: US OH Perrysburg
- Agency: Dickstein Shapiro LLP
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L21/66 ; G01B11/06 ; G01N21/84
Abstract:
A metrology system for gauging and spatially mapping a semiconductor material on a substrate can be used in controlling deposition and thermal activation processes.
Public/Granted literature
- US20140065731A1 IN-LINE METROLOGY SYSTEM Public/Granted day:2014-03-06
Information query
IPC分类:
