Invention Grant
US09123765B2 Susceptor support shaft for improved wafer temperature uniformity and process repeatability
有权
Susceptor支撑轴用于提高晶片温度均匀性和工艺重复性
- Patent Title: Susceptor support shaft for improved wafer temperature uniformity and process repeatability
- Patent Title (中): Susceptor支撑轴用于提高晶片温度均匀性和工艺重复性
-
Application No.: US14182634Application Date: 2014-02-18
-
Publication No.: US09123765B2Publication Date: 2015-09-01
- Inventor: Mehmet Tugrul Samir , Shu-Kwan Lau
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, LLP
- Main IPC: B05C13/00
- IPC: B05C13/00 ; H01L21/687 ; B05C11/08
Abstract:
Embodiments of the invention generally relate to susceptor support shafts and process chambers containing the same. A susceptor support shaft supports a susceptor thereon, which in turn, supports a substrate during processing. The susceptor support shaft reduces variations in temperature measurement of the susceptor and/or substrate by providing a consistent path for a pyrometer focal beam directed towards the susceptor and/or substrate, even when the susceptor support shaft is rotated. The susceptor support shafts also have a relatively low thermal mass which increases the ramp up and ramp down rates of a process chamber.
Public/Granted literature
- US20140251208A1 SUSCEPTOR SUPPORT SHAFT FOR IMPROVED WAFER TEMPERATURE UNIFORMITY AND PROCESS REPEATABILITY Public/Granted day:2014-09-11
Information query
