发明授权
- 专利标题: Watermark and manufacturing method therefor
- 专利标题(中): 水印及其制造方法
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申请号: US14082897申请日: 2013-11-18
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公开(公告)号: US09124819B2公开(公告)日: 2015-09-01
- 发明人: Hsi-Chun Wang , Ya-Wen Cheng
- 申请人: National Taiwan Normal University
- 申请人地址: TW Taipei
- 专利权人: NATIONAL TAIWAN NORMAL UNIVERSITY
- 当前专利权人: NATIONAL TAIWAN NORMAL UNIVERSITY
- 当前专利权人地址: TW Taipei
- 代理机构: Lowe Hauptman & Ham, LLP
- 优先权: TW102120135A 20130606
- 主分类号: H04N1/40
- IPC分类号: H04N1/40 ; H04N1/405 ; G06K15/00 ; H04N1/32 ; H04N1/00
摘要:
A watermark and a manufacturing method therefor are provided. The watermark has a first region comprising amplitude modulation (AM) halftone dots and a second region comprising frequency modulation (FM) halftone dots, and each of the amplitude modulation halftone dots has ink portions and blank portions, each of which is located between the two ink portions in the same amplitude modulation halftone dot. The ink area percentage of the amplitude modulation halftone dots are dispersed by filling the blank portions into each of the amplitude modulation halftone dots, so that the density calibration of the amplitude modulation halftone dots and frequency modulation halftone dots can be omitted.
公开/授权文献
- US20140362414A1 WATERMARK AND MANUFACTURING METHOD THEREFOR 公开/授权日:2014-12-11
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