Invention Grant
- Patent Title: Process kit and target for substrate processing chamber
- Patent Title (中): 基板处理室的工艺套件和目标
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Application No.: US11553982Application Date: 2006-10-27
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Publication No.: US09127362B2Publication Date: 2015-09-08
- Inventor: Kathleen Scheible , Michael Allen Flanigan , Goichi Yoshidome , Adolph Miller Allen , Cristopher M. Pavloff
- Applicant: Kathleen Scheible , Michael Allen Flanigan , Goichi Yoshidome , Adolph Miller Allen , Cristopher M. Pavloff
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Janah & Associates, PC
- Agent Ashok K. Janah
- Main IPC: C23C14/00
- IPC: C23C14/00 ; C23C14/50 ; H01L21/687 ; C23C14/34 ; H01J37/34
Abstract:
A process kit comprises a ring assembly that is placed about a substrate support in a substrate processing chamber to reduce deposition of process deposits on the chamber components and on an overhang edge of the substrate. The process kit includes a deposition ring, cover ring, and anti-lift bracket, and can also include a unitary shield. A target is also described.
Public/Granted literature
- US20070102286A1 PROCESS KIT AND TARGET FOR SUBSTRATE PROCESSING CHAMBER Public/Granted day:2007-05-10
Information query
IPC分类:
