Invention Grant
- Patent Title: High voltage field effect transistor finger terminations
- Patent Title (中): 高电压场效应晶体管手指端接
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Application No.: US13795926Application Date: 2013-03-12
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Publication No.: US09136341B2Publication Date: 2015-09-15
- Inventor: Kevin Wesley Kobayashi , Haldane S. Henry , Andrew P. Ritenour
- Applicant: RF Micro Devices, Inc.
- Applicant Address: US NC Greensboro
- Assignee: RF Micro Devices, Inc.
- Current Assignee: RF Micro Devices, Inc.
- Current Assignee Address: US NC Greensboro
- Agency: Withrow & Terranova, P.L.L.C.
- Main IPC: H01L29/417
- IPC: H01L29/417 ; H01L29/423 ; H01L29/812 ; H01L29/66 ; H01L29/40 ; H01L29/778 ; H01L29/16 ; H01L29/20

Abstract:
A field effect transistor having at least one structure configured to redistribute and/or reduce an electric field from gate finger ends is disclosed. Embodiments of the field effect transistor include a substrate, an active region disposed on the substrate, at least one source finger in contact with the active region, at least one drain finger in contact with the active region, and at least one gate finger in rectifying contact with the active region. One embodiment has at least one end of the at least one gate finger extending outside of the active region. Another embodiment includes at least one source field plate integral with the at least one source finger. The at least one source field plate extends over the at least one gate finger that includes a portion outside of the active region. Either embodiment can also include a sloped gate foot to further improve high voltage operation.
Public/Granted literature
- US20130277687A1 HIGH VOLTAGE FIELD EFFECT TRANSITOR FINGER TERMINATIONS Public/Granted day:2013-10-24
Information query
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