发明授权
US09139695B2 Polyetherimide resins with very low levels of residual contamination
有权
具有非常低残留污染水平的聚醚酰亚胺树脂
- 专利标题： Polyetherimide resins with very low levels of residual contamination
- 专利标题（中）： 具有非常低残留污染水平的聚醚酰亚胺树脂
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申请号： US14027814申请日： 2013-09-16
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公开(公告)号： US09139695B2公开(公告)日： 2015-09-22
- 发明人: Daniel Francis Lowery , Jamuna Chakravarti , Aaron Royer
- 申请人： SABIC INNOVATIVE PLASTICS IP B.V.
- 申请人地址： NL Bergen op Zoom
- 专利权人： SABIC Global Technologies B.V.
- 当前专利权人： SABIC Global Technologies B.V.
- 当前专利权人地址： NL Bergen op Zoom
- 代理机构： Novak Druce Connolly Bove + Quigg LLP
- 主分类号： G11B5/40
- IPC分类号： G11B5/40 ; C08G73/10 ; C08L71/00 ; C08L79/08 ; D01D5/098 ; G11B25/04 ; G11B33/02 ; C08L81/06
摘要：
Compositions and methods for producing compositions comprising a monoamine-endcapped polyimide component. Based on a gas chromatography mass spectroscopy analysis of a surface rinse of the composition performed at room temperature, the composition can have at least one surface with less than or equal to 5 ppb releasable phosphorous residuals, and less than or equal to 5 ppb releasable volatile organic compound residuals. The composition can also comprise less than or equal to 10 ppb combined releasable residuals. Because of the very low levels of residual contamination, the compositions can be used to produce a variety of articles including a disk drive.
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