Invention Grant
- Patent Title: EUV pellicle frame with holes and method of forming
- Patent Title (中): 具有孔的EUV防护薄膜框架和成型方法
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Application No.: US14106219Application Date: 2013-12-13
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Publication No.: US09140975B2Publication Date: 2015-09-22
- Inventor: Lei Sun , Chanro Park , Wenhui Wang , Hui Zang
- Applicant: GLOBALFOUNDRIES Inc.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES INC.
- Current Assignee: GLOBALFOUNDRIES INC.
- Current Assignee Address: KY Grand Cayman
- Agency: Ditthavong & Steiner, P.C.
- Main IPC: G03F1/62
- IPC: G03F1/62 ; G03F1/64 ; G03F1/00 ; G03F1/22
Abstract:
A method of forming an improved EUV mask and pellicle with airflow between the area enclosed by the mask and pellicle and the area outside the mask and pellicle and the resulting device are disclosed. Embodiments include forming a frame around a patterned area on an EUV mask; forming a membrane over the frame; and forming holes in the frame.
Public/Granted literature
- US20150168824A1 EUV PELLICLE FRAME WITH HOLES AND METHOD OF FORMING Public/Granted day:2015-06-18
Information query
