Invention Grant
- Patent Title: Method of forming a pattern
- Patent Title (中): 形成图案的方法
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Application No.: US13950799Application Date: 2013-07-25
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Publication No.: US09141751B2Publication Date: 2015-09-22
- Inventor: Hyun-Jong Lee , Soo-Han Choi , Jung-Ho Do , Chul-Hong Park , Sang-Pil Sim
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-Si, Gyeonggi-Do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-Si, Gyeonggi-Do
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2012-0096707 20120831
- Main IPC: G06F17/50
- IPC: G06F17/50 ; H01L21/308

Abstract:
A method of forming a pattern includes defining a plurality of patterns, defining a plurality of pitch violating patterns that contact the plurality of patterns and correspond to regions between the patterns, classifying the plurality of pitch violating patterns into a first region and a second region that is adjacent to the first region, selecting one of the first region and the second region, and forming an initial pattern defined as the selected first or second region. The selecting includes performing at least one of i) selecting a region that contact dummy patterns, ii) selecting a region of a same kind as one region, and iii) selecting a region that contacts a concave part of an enclosure from the first region and the second region.
Public/Granted literature
- US20140162460A1 METHOD OF FORMING A PATTERN Public/Granted day:2014-06-12
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