Invention Grant
- Patent Title: Gas mixture method and apparatus for generating ion beam
- Patent Title (中): 用于产生离子束的气体混合法和设备
-
Application No.: US13692461Application Date: 2012-12-03
-
Publication No.: US09147550B2Publication Date: 2015-09-29
- Inventor: Wei-Cheng Lin , Zhimin Wan , Koulin Hu
- Applicant: ADVANCED ION BEAM TECHNOLOGY, INC.
- Applicant Address: TW Hsinchu
- Assignee: ADVANCED ION BEAM TECHNOLOGY, INC.
- Current Assignee: ADVANCED ION BEAM TECHNOLOGY, INC.
- Current Assignee Address: TW Hsinchu
- Agency: Muncy, Geissler, Olds & Lowe P.C.
- Main IPC: H01J27/00
- IPC: H01J27/00 ; H01J27/02 ; H01J37/08

Abstract:
A gas mixture method and apparatus of prolonging lifetime of an ion source for generating an ion beam particularly an ion beam containing carbon is proposed here. By mixing the dopant gas and the minor gas together to generate an ion beam, undesired reaction between the gas species and the ion source can be mitigated and thus lifetime of the ion source can be prolonged. Accordingly, quality of ion beam can be maintained.
Public/Granted literature
- US20140151572A1 GAS MIXTURE METHOD AND APPARATUS FOR GENERATING ION BEAM Public/Granted day:2014-06-05
Information query