发明授权
- 专利标题： Sputter device
- 专利标题（中）： 溅射装置
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申请号： US13446873申请日： 2012-04-13
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公开(公告)号： US09147557B2公开(公告)日： 2015-09-29
- 发明人: Yong-Sup Choi , Myung-Soo Huh
- 申请人： Yong-Sup Choi , Myung-Soo Huh
- 申请人地址： KR Yongin-si
- 专利权人： Samsung Display Co., Ltd.
- 当前专利权人： Samsung Display Co., Ltd.
- 当前专利权人地址： KR Yongin-si
- 代理机构： Christie, Parker & Hale, LLP
- 优先权： KR10-2011-0076042 20110729
- 主分类号： C23C14/28
- IPC分类号： C23C14/28 ; H01J37/32 ; C23C14/35 ; H01J37/34
摘要：
A sputter device including a plurality of targets having magnetism; a reflector having magnetism and arranged between neighboring targets of the plurality of targets; a wave guide having magnetism and arranged adjacent the targets, the wave guide forming a guide space for guiding microwaves; and a limiter having magnetism and arranged adjacent the wave guide, the limiter forming an electron cyclotron resonance area together with the targets, the reflector, and the wave guide.
公开/授权文献
- US20130026035A1 SPUTTER DEVICE 公开/授权日：2013-01-31
信息查询
IPC分类:
