Invention Grant
US09147585B2 Method for fabricating a plurality of semiconductor devices 有权
制造多个半导体器件的方法

Method for fabricating a plurality of semiconductor devices
Abstract:
A number of semiconductor chips each include a first main face and a second main face opposite to the first main face. A first encapsulation layer is applied over the second main faces of the semiconductor chips. An electrical wiring layer is applied over the first main faces of the first semiconductor chips. A second encapsulation layer is applied over the electrical wiring layer. The thickness of the first encapsulation layer and the thicknesses of the first semiconductor chips is reduced. The structure can be singulated to obtain a plurality of semiconductor devices.
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