Invention Grant
- Patent Title: Method for fabricating a plurality of semiconductor devices
- Patent Title (中): 制造多个半导体器件的方法
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Application No.: US14535591Application Date: 2014-11-07
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Publication No.: US09147585B2Publication Date: 2015-09-29
- Inventor: Thomas Kilger , Ulrich Wachter , Dominic Maier , Gottfried Beer
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H01L21/44
- IPC: H01L21/44 ; H01L21/48 ; H01L21/50 ; H01L21/82 ; H01L21/56 ; H01L23/538 ; H01L27/04 ; H01L49/02 ; H01L23/00 ; H01L21/78 ; H01L25/00 ; H01L23/498 ; H01L23/31

Abstract:
A number of semiconductor chips each include a first main face and a second main face opposite to the first main face. A first encapsulation layer is applied over the second main faces of the semiconductor chips. An electrical wiring layer is applied over the first main faces of the first semiconductor chips. A second encapsulation layer is applied over the electrical wiring layer. The thickness of the first encapsulation layer and the thicknesses of the first semiconductor chips is reduced. The structure can be singulated to obtain a plurality of semiconductor devices.
Public/Granted literature
- US20150064846A1 Semiconductor Device Public/Granted day:2015-03-05
Information query
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