发明授权
- 专利标题: Display panel including patterned spacer
- 专利标题(中): 显示面板包括图案间隔
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申请号: US11629476申请日: 2005-07-05
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公开(公告)号: US09152041B2公开(公告)日: 2015-10-06
- 发明人: Sung Hyun Kim , Jin Suek Kim , Kyung Jun Kim , Seung Hee Lee , Il Eok Kwon , Jeong Ae Yoon
- 申请人: Sung Hyun Kim , Jin Suek Kim , Kyung Jun Kim , Seung Hee Lee , Il Eok Kwon , Jeong Ae Yoon
- 申请人地址: KR Seoul
- 专利权人: LG CHEM, LTD.
- 当前专利权人: LG CHEM, LTD.
- 当前专利权人地址: KR Seoul
- 代理机构: Dentons US LLP
- 优先权: KR10-2004-0052104 20040705
- 国际申请: PCT/KR2005/002121 WO 20050705
- 国际公布: WO2006/004364 WO 20060112
- 主分类号: C09K19/00
- IPC分类号: C09K19/00 ; G03F7/00 ; G03F7/029
摘要:
Disclosed is a display panel including a lower substrate, upper substrate, and a patterned spacer that causes the lower substrate and upper substrate to be spaced apart from each other by a predetermined distance, wherein the patterned spacer is obtained from a photosensitive resin composition comprising: (a) a triazine-based photopolymerization initiator represented by the following formula 1; (b) an alkali-soluble photo polymerizable reactive resin binder; and (c) a polymerizable compound: (wherein each of R1-R5 has the same meaning as defined herein). A photosensitive resin composition for use in a patterned spacer is also disclosed, the composition comprising: (a) a triazine-based photopolymerization initiator represented by the following formula 1; (b) an alkali-soluble photopolymerizable reactive resin binder; (c) a polymerizable compound; and (d) a solvent. The photosensitive resin composition shows high sensitivity and excellent properties related with development, and provides a patterned spacer having excellent strength, sensitivity, residue characteristics, film uniformity, residual film ratio, etc.
公开/授权文献
- US20080213514A1 Display Panel Including Patterned Spacer 公开/授权日:2008-09-04
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