发明授权
US09153421B2 Passive capacitively-coupled electrostatic (CCE) probe method for detecting plasma instabilities in a plasma processing chamber
有权
用于检测等离子体处理室中的等离子体不稳定性的无源电容耦合静电（CCE）探针方法
- 专利标题： Passive capacitively-coupled electrostatic (CCE) probe method for detecting plasma instabilities in a plasma processing chamber
- 专利标题（中）： 用于检测等离子体处理室中的等离子体不稳定性的无源电容耦合静电（CCE）探针方法
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申请号： US13470187申请日： 2012-05-11
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公开(公告)号： US09153421B2公开(公告)日： 2015-10-06
- 发明人: Jean-Paul Booth , Mikio Nagai , Douglas Keil
- 申请人： Jean-Paul Booth , Mikio Nagai , Douglas Keil
- 申请人地址： US CA Fremont
- 专利权人： LAM RESEARCH CORPORATION
- 当前专利权人： LAM RESEARCH CORPORATION
- 当前专利权人地址： US CA Fremont
- 主分类号： G01R31/00
- IPC分类号： G01R31/00 ; H01J37/32
摘要：
A method for detecting plasma instability within a processing chamber of a plasma processing system during substrate processing is provided. The method includes collecting a set of process data, the process data including a set of induced current signals flowing through a measuring capacitor. The method further includes converting the set of induced current signals into a set of analog voltage signals and converting the set of analog voltage signals into a set of digital signals. The method also includes analyzing the set of digital signals to detect high frequency perturbations, the high frequency perturbations indicating the plasma instability.