Invention Grant
- Patent Title: Mask
- Patent Title (中): 面具
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Application No.: US14357650Application Date: 2013-04-12
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Publication No.: US09158193B2Publication Date: 2015-10-13
- Inventor: Wusheng Li
- Applicant: BOE TECHNOLOGY GROUP CO., LTD.
- Applicant Address: CN Beijing
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee Address: CN Beijing
- Agency: Collard & Roe, P.C.
- Priority: CN201310056668 20130222
- International Application: PCT/CN2013/074138 WO 20130412
- International Announcement: WO2014/127569 WO 20140828
- Main IPC: G03F1/38
- IPC: G03F1/38 ; G03F1/00
Abstract:
A mask is disclosed. The mask includes a light-blocking region and a slit-like light-transmitting region. The slit includes two edges that are disposed oppositely to each other, and each of the edges is made up of a plurality of arcs.
Public/Granted literature
- US20150177611A1 MASK Public/Granted day:2015-06-25
Information query
