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公开(公告)号：US11828959B2
公开(公告)日：2023-11-28
申请号：US16660386
申请日：2019-10-22
Applicant: BOE TECHNOLOGY GROUP CO., LTD.
Inventor： Wusheng Li , Qi Yao
CPC classification number: G02B5/1857 , G02B30/27 , G03F7/0005 , G03F7/2051 , G03F7/40 , G03F7/70291
Abstract: A grating structure, a manufacturing method thereof and a display device are provided. The method of manufacturing the grating structure includes: forming a photosensitive material layer on a substrate; patterning the photosensitive material layer to form a grating transition pattern, where the grating transition pattern includes multiple grating units, the multiple grating units each include a first portion and a second portion which are symmetric, and at least one of the first portion and the second portion includes multiple subunits to have a stepped structure; and curing the grating transition pattern to form the grating structure.
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公开(公告)号：US11538786B2
公开(公告)日：2022-12-27
申请号：US16649801
申请日：2019-03-19
Inventor： Xinglong Luan , Jing Feng , Fuqiang Li , Zhichong Wang , Peng Liu , Wusheng Li , Chunjing Liu
Abstract: A transfer printing method and a transfer printing apparatus. The transfer method includes: transferring a plurality of devices formed on an original substrate to a transfer substrate; obtaining first position information of positions of the plurality of devices on the transfer substrate; obtaining second position information of corresponding positions, on a target substrate, of devices to be transferred; comparing the first position information with the second position information to obtain first target position information recording a first transfer position; and aligning the transfer substrate with the target substrate and performing a site-designated laser irradiation on at least part of devices on the transfer substrate corresponding to the first transfer position, simultaneously, according to the first target position information, so as to transfer the at least part of the devices from the transfer substrate to the target substrate.
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公开(公告)号：US20210225975A1
公开(公告)日：2021-07-22
申请号：US16765232
申请日：2019-11-26
Applicant: BOE TECHNOLOGY GROUP CO., LTD.
Inventor： Yanan Niu , Jiushi Wang , Zhanfeng Cao , Qi Yao , Feng Zhang , Wusheng Li , Feng Guan , Lei Chen , Hongwei Tian
IPC: H01L27/32
Abstract: A display substrate is provided. The display substrate includes a substrate (1), a first transistor (2) and a second transistor (3) on the substrate (1), directions of intrinsic threshold voltage shifts of the first transistor (2) and the second transistor (3) being opposite; and a shift adjustment structure (4) on the substrate (1). The shift adjustment structure (4) may be configured to input adjustment signals to the first transistor (2) and the second transistor (3) respectively to make threshold voltages of the first transistor (2) and the second transistor (3) shift in directions opposite to the directions of their intrinsic threshold voltage shifts respectively.
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公开(公告)号：US09891351B2
公开(公告)日：2018-02-13
申请号：US15032259
申请日：2015-09-18
Applicant: BOE TECHNOLOGY GROUP CO., LTD.
Inventor： Wusheng Li , Ki Man Kim
CPC classification number: G02B5/021 , B05D1/005 , G02B1/14 , G02B5/003 , G02B5/02 , G02B5/0215 , G02B5/0221 , G02B5/0226 , G02B5/0268 , G03F7/70025 , G06F3/041 , G06F3/0412 , G06F3/0416 , G06F3/044 , G06F2203/04102 , G06F2203/04103 , H05K1/028 , H05K2201/05
Abstract: The present disclosure provides a display substrate. The display substrate includes a substrate having a display area and a border area surrounding the display area; a non-black photo-resist layer formed on the substrate in the border area; and a black photo-resist layer formed on the non-black photo-resist layer. The non-black photo-resist layer interfaces the black photo-resist layer with a diffusion structure.
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公开(公告)号：US09158193B2
公开(公告)日：2015-10-13
申请号：US14357650
申请日：2013-04-12
Applicant: BOE TECHNOLOGY GROUP CO., LTD.
Inventor： Wusheng Li
Abstract: A mask is disclosed. The mask includes a light-blocking region and a slit-like light-transmitting region. The slit includes two edges that are disposed oppositely to each other, and each of the edges is made up of a plurality of arcs.
Abstract translation: 公开了一种掩模。 掩模包括遮光区域和狭缝状透光区域。 狭缝包括彼此相对设置的两个边缘，并且每个边缘由多个弧形构成。
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Patent Agency Ranking
公开(公告)号：US11502153B2
公开(公告)日：2022-11-15
申请号：US16761823
申请日：2019-03-26
Applicant: BOE Technology Group Co., Ltd.
Inventor： Renquan Gu , Qi Yao , Jaiil Ryu , Zhiwei Liang , Yingwei Liu , Wusheng Li , Muxin Di
IPC: H01L27/32
Abstract: An array substrate and a manufacturing method thereof, a display device and a manufacturing method thereof are provided, which belong to the technical field of display. The array substrate includes: an interposer substrate, a thin-film transistor disposed on one side of the interposer substrate, and a bonding connection line embedded in the other side of the interposer substrate. The bonding connection line is configured to be connected to a drive circuit. An interposer via hole is arranged on the interposer substrate. A conductive structure is arranged in the interposer via hole. The thin-film transistor is electrically connected to the bonding connection line by the conductive structure.
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公开(公告)号：US11309528B2
公开(公告)日：2022-04-19
申请号：US16769374
申请日：2019-10-08
Applicant: BOE TECHNOLOGY GROUP CO., LTD.
Inventor： Wei He , Huili Wu , Shipei Li , Dongsheng Li , Fang He , Renquan Gu , Sheng Xu , Dongsheng Yin , Wusheng Li , Qi Yao
Abstract: The present disclosure relates to a method of fabricating a flexible display panel. The method of fabricating the flexible display panel may include forming a photosensitive layer comprising at least one azo group on a carrier substrate; forming a flexible substrate on the photosensitive layer; irradiating the photosensitive layer with ultraviolet light; and peeling off the flexible substrate from the carrier substrate.
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公开(公告)号：US11276739B2
公开(公告)日：2022-03-15
申请号：US16765232
申请日：2019-11-26
Applicant: BOE TECHNOLOGY GROUP CO., LTD.
Inventor： Yanan Niu , Jiushi Wang , Zhanfeng Cao , Qi Yao , Feng Zhang , Wusheng Li , Feng Guan , Lei Chen , Hongwei Tian
IPC: H01L27/32
Abstract: A display substrate is provided. The display substrate includes a substrate (1), a first transistor (2) and a second transistor (3) on the substrate (1), directions of intrinsic threshold voltage shifts of the first transistor (2) and the second transistor (3) being opposite; and a shift adjustment structure (4) on the substrate (1). The shift adjustment structure (4) may be configured to input adjustment signals to the first transistor (2) and the second transistor (3) respectively to make threshold voltages of the first transistor (2) and the second transistor (3) shift in directions opposite to the directions of their intrinsic threshold voltage shifts respectively.
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公开(公告)号：US20180246403A1
公开(公告)日：2018-08-30
申请号：US15719090
申请日：2017-09-28
Applicant: BOE Technology Group Co., Ltd.
Inventor： Wusheng Li
CPC classification number: G03F1/44 , G01B21/02 , G01B21/16 , G03F1/84 , G03F7/0035 , G03F7/095 , G03F7/162 , G03F7/168 , G03F7/20 , G03F7/26 , G03F7/70641
Abstract: Embodiments of the disclosure disclose a method and structure for detecting distortion in a pattern. In this solution, a first photosensitive material is exposed and developed to form a desirable pattern to be detected, and also a detection step including two levels at different heights is formed in a preset detection area of the pattern to be detected; and then a second photosensitive material is exposed and developed according to the same exposure machine parameters to form a detection pattern in the detection area for detecting exposure defocusing, and if preset size parameters of the detection pattern at the two levels of the detection step are consistent, then it is indicated that the formed pattern to be detected is not distorted due to exposure defocusing; otherwise, it is indicated that the pattern to be detected is distorted due to exposure defocusing.
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公开(公告)号：US11711948B2
公开(公告)日：2023-07-25
申请号：US17319409
申请日：2021-05-13
Applicant: BOE TECHNOLOGY GROUP CO., LTD.
Inventor： Shipei Li , Sheng Xu , Wei He , Ying Zhao , Huili Wu , Fang He , Renquan Gu , Lizhen Zhang , Yi Zhou , Wusheng Li , Qi Yao , Yang Yue
IPC: H01L27/32 , H10K59/123 , H10K59/122 , H10K59/124 , H10K71/00 , H10K59/12
CPC classification number: H10K59/123 , H10K59/122 , H10K59/124 , H10K71/00 , H10K59/1201
Abstract: The present disclosure relates to the field of display technology, and proposes a display panel, a preparation method thereof, and a display apparatus. The display panel includes an array substrate, a planarization layer group, and a plurality of sub-pixels. The array substrate includes a switch array formed by a plurality of switch units. The planarization layer group is provided on the array substrate, and nano-scale grooves are provided on the planarization layer group. The sub-pixels are provided on a side of the planarization layer group away from the array substrate. The sub-pixel includes a plurality of first electrodes, wherein the first electrode is connected to the switch unit of the array substrate, a nano-scale second gap is provided between two adjacent first electrodes, and an orthographic projection of the second gap on the array substrate is located within an orthographic projection of the groove on the array substrate.
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