发明授权
- 专利标题: Nonvolatile memory devices and methods of forming the same
- 专利标题(中): 非易失存储器件及其形成方法
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申请号: US14136522申请日: 2013-12-20
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公开(公告)号: US09159914B2公开(公告)日: 2015-10-13
- 发明人: Eun-Kyung Yim , In-Gyu Baek , Jang-Eun Lee , Se-Chung Oh , Kyung-Tae Nam , Jin-Shi Zhao
- 申请人: Samsung Electronics Co., LTD.
- 申请人地址: KR
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR
- 代理机构: Onello & Mello, LLP
- 优先权: KR10-2007-0016453 20070216
- 主分类号: H01L27/108
- IPC分类号: H01L27/108 ; H01L27/112 ; H01L45/00 ; H01L27/24
摘要:
A nonvolatile memory device includes a bottom electrode on a semiconductor substrate, a data storage layer on the bottom electrode, the data storage layer including a transition metal oxide, and a switching layer provided on a top surface and/or a bottom surface of the data storage layer, wherein a bond energy of material included in the switching layer and oxygen is more than a bond energy of a transition metal in the transition metal oxide and oxygen.
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