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    Nonvolatile memory devices that use resistance materials and internal electrodes
    1.
    发明授权
    Nonvolatile memory devices that use resistance materials and internal electrodes 有权
    使用电阻材料和内部电极的非易失性存储器件

    公开(公告)号：US08698281B2

    公开(公告)日：2014-04-15

    申请号：US13655584

    申请日：2012-10-19

    申请人： Samsung Electronics Co., Ltd.

    发明人： In-Gyu Baek ,  Hyun-Jun Sim ,  Jin-Shi Zhao ,  Eun-Kyung Yim

    IPC分类号： H01L29/00

    CPC分类号： G11C13/0007 ,  G11C13/00 ,  G11C13/0004 ,  G11C13/0011 ,  G11C13/003 ,  G11C2213/31 ,  G11C2213/32 ,  G11C2213/78 ,  G11C2213/79 ,  H01L27/2436 ,  H01L27/249 ,  H01L45/04 ,  H01L45/06 ,  H01L45/085 ,  H01L45/1226 ,  H01L45/146 ,  H01L45/1633

    摘要： A nonvolatile memory device, a method of fabricating the nonvolatile memory device and a processing system including the nonvolatile memory device. The nonvolatile memory device may include a plurality of internal electrodes that extend in a direction substantially perpendicular to a face of a substrate, a plurality of first external electrodes that extend substantially in parallel with the face of the substrate, and a plurality of second external electrodes that also extend substantially in parallel with the face of the substrate. Each first external electrode is on a first side of a respective one of the internal electrodes, and each second external electrode is on a second side of a respective one of the internal electrodes. These devices also include a plurality of variable resistors that contact the internal electrodes, the first external electrodes and the second external electrodes.

    摘要翻译： 非易失性存储器件，非易失性存储器件的制造方法和包括非易失性存储器件的处理系统。 非易失性存储装置可以包括沿基板垂直于基板的方向延伸的多个内部电极，基本上平行于基板的表面延伸的多个第一外部电极和多个第二外部电极 其也基本上平行于衬底的表面延伸。 每个第一外部电极在相应的一个内部电极的第一侧上，并且每个第二外部电极在相应的一个内部电极的第二侧上。 这些器件还包括接触内部电极，第一外部电极和第二外部电极的多个可变电阻器。

    Nonvolatile Memory Devices that Use Resistance Materials and Internal Electrodes
    2.
    发明申请
    Nonvolatile Memory Devices that Use Resistance Materials and Internal Electrodes 有权
    使用电阻材料和内部电极的非易失性存储器件

    公开(公告)号：US20130043453A1

    公开(公告)日：2013-02-21

    申请号：US13655584

    申请日：2012-10-19

    申请人： Samsung Electronics Co., Ltd.

    发明人： In-Gyu Baek ,  Hyun-Jun Sim ,  Jin-Shi Zhao ,  Eun-Kyung Yim

    IPC分类号： H01L45/00

    CPC分类号： G11C13/0007 ,  G11C13/00 ,  G11C13/0004 ,  G11C13/0011 ,  G11C13/003 ,  G11C2213/31 ,  G11C2213/32 ,  G11C2213/78 ,  G11C2213/79 ,  H01L27/2436 ,  H01L27/249 ,  H01L45/04 ,  H01L45/06 ,  H01L45/085 ,  H01L45/1226 ,  H01L45/146 ,  H01L45/1633

    摘要： A nonvolatile memory device, a method of fabricating the nonvolatile memory device and a processing system including the nonvolatile memory device. The nonvolatile memory device may include a plurality of internal electrodes that extend in a direction substantially perpendicular to a face of a substrate, a plurality of first external electrodes that extend substantially in parallel with the face of the substrate, and a plurality of second external electrodes that also extend substantially in parallel with the face of the substrate. Each first external electrode is on a first side of a respective one of the internal electrodes, and each second external electrode is on a second side of a respective one of the internal electrodes. These devices also include a plurality of variable resistors that contact the internal electrodes, the first external electrodes and the second external electrodes.

    摘要翻译： 非易失性存储器件，非易失性存储器件的制造方法和包括非易失性存储器件的处理系统。 非易失性存储装置可以包括沿基板垂直于基板的方向延伸的多个内部电极，基本上平行于基板的表面延伸的多个第一外部电极和多个第二外部电极 其也基本上平行于衬底的表面延伸。 每个第一外部电极在相应的一个内部电极的第一侧上，并且每个第二外部电极在相应的一个内部电极的第二侧上。 这些器件还包括接触内部电极，第一外部电极和第二外部电极的多个可变电阻器。