Invention Grant
- Patent Title: Immersion liquid, exposure apparatus, and exposure process
- Patent Title (中): 浸液，曝光装置和曝光过程
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Application No.: US14504130Application Date: 2014-10-01
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Publication No.: US09164391B2Publication Date: 2015-10-20
- Inventor: Hans Jansen , Marco Koert Stavenga , Jacobus Johannus Leonardus Hendricus Verspay , Franciscus Johannes Joseph Janssen , Anthonie Kuijper
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: H01L21/67
- IPC: H01L21/67 ; G03F7/20
Abstract:
An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.
Public/Granted literature
- US20150056559A1 IMMERSION LIQUID, EXPOSURE APPARATUS, AND EXPOSURE PROCESS Public/Granted day:2015-02-26
Information query
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