An exposure apparatus that includes a projection optical system, and exposes a substrate to light via the projection optical system and a liquid that is supplied between the projection optical system and the substrate. A plurality of recovery ports recover the liquid supplied between the projection optical system and the substrate, and are discretely arranged between vertices on each side of a polygon and at each of the vertices of the polygon. A chamber, connected to the plurality of recovery ports, receives the liquid. A pump attracts the liquid via the plurality of recovery ports and the chamber. A pressure difference between the pump and each of the recovery ports positioned at the vertices, among the plurality of recovery ports, is less than a pressure difference between the pump and each of the recovery ports positioned between the vertices, among the plurality of recovery ports.