Invention Grant
- Patent Title: Stabilization structure including sacrificial release layer and staging cavity
- Patent Title (中): 稳定结构包括牺牲脱层和分级腔
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Application No.: US13754717Application Date: 2013-01-30
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Publication No.: US09166114B2Publication Date: 2015-10-20
- Inventor: Hsin-Hua Hu , Andreas Bibl
- Applicant: LUXVUE TECHNOLOGY CORPORATION
- Applicant Address: US CA Santa Clara
- Assignee: LuxVue Technology Corporation
- Current Assignee: LuxVue Technology Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Blakely, Sokoloff, Taylor & Zafman LLP
- Main IPC: H01L27/15
- IPC: H01L27/15 ; H01L21/58 ; H01L33/48 ; H01L33/00 ; B81C99/00 ; H01L25/075
Abstract:
A method and structure for stabilizing an array of micro devices is disclosed. The array of micro devices is held within an array of staging cavities on a carrier substrate. Each micro device is laterally surrounded by sidewalls of a corresponding staging cavity.
Public/Granted literature
- US20140159065A1 STABILIZATION STRUCTURE INCLUDING SACRIFICIAL RELEASE LAYER AND STAGING CAVITY Public/Granted day:2014-06-12
Information query
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