Invention Grant
- Patent Title: Method of processing target material in a sample
- Patent Title (中): 在样品中处理目标材料的方法
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Application No.: US13723287Application Date: 2012-12-21
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Publication No.: US09176095B2Publication Date: 2015-11-03
- Inventor: Kyu-youn Hwang , Sung-hong Kwon , Joon-ho Kim
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-Si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-Si
- Agency: Leydig, Voit & Mayer, Ltd.
- Priority: KR10-2012-0036243 20120406
- Main IPC: G01N1/34
- IPC: G01N1/34 ; G01N27/447 ; G01N1/28 ; C12N1/06 ; B01L3/00
Abstract:
An efficient method of processing a target material in a sample using a microfluidic device including an elastic membrane.
Public/Granted literature
- US20130264205A1 METHOD OF PROCESSING TARGET MATERIAL IN A SAMPLE Public/Granted day:2013-10-10
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