发明授权
- 专利标题： Resist composition and method for producing resist pattern
- 专利标题（中）： 抗蚀剂组合物和抗蚀剂图案的制造方法
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申请号： US13441185申请日： 2012-04-06
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公开(公告)号： US09176378B2公开(公告)日： 2015-11-03
- 发明人: Koji Ichikawa , Takahiro Yasue , Satoshi Yamaguchi
- 申请人： Koji Ichikawa , Takahiro Yasue , Satoshi Yamaguchi
- 申请人地址： JP Tokyo
- 专利权人： SUMITOMO CHEMICAL COMPANY, LIMITED
- 当前专利权人： SUMITOMO CHEMICAL COMPANY, LIMITED
- 当前专利权人地址： JP Tokyo
- 代理机构： Birch, Stewart, Kolasch & Birch, LLP
- 优先权： JP2011-085016 20110407
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/039 ; G03F7/20
摘要：
A resist composition of the invention includes: (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator represented by the formula (II), and (D) a compound represented by the formula (I), wherein R1, R2, m, n, Q1, Q2, L1, ring W1 and Z+ are defined in the specification.
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