Invention Grant
- Patent Title: Photolithographic patterning of polymeric materials
- Patent Title (中): 聚合材料的光刻图案化
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Application No.: US13315538Application Date: 2011-12-09
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Publication No.: US09176384B2Publication Date: 2015-11-03
- Inventor: Robert Charters , Dax Kukulj
- Applicant: Robert Charters , Dax Kukulj
- Applicant Address: US DE Wilmington
- Assignee: ZETT RESEARCH AND DEVELOPMENT LLC—RPO SERIES
- Current Assignee: ZETT RESEARCH AND DEVELOPMENT LLC—RPO SERIES
- Current Assignee Address: US DE Wilmington
- Agency: Mattingly & Malur, PC
- Main IPC: B32B3/10
- IPC: B32B3/10 ; G03F7/09 ; B32B15/085 ; B32B15/09 ; B32B15/20 ; B32B27/00 ; B32B27/18 ; B32B27/36 ; G02B6/122 ; G02B6/138 ; G03F7/11

Abstract:
The invention comprises methods for the photolithographic patterning of features in a photo-curable polymer composition coated onto a plastic substrate. In one embodiment of this invention, the plastic substrate is coated with a reflective film such as a metallic barrier. In another embodiment, the plastic substrate is coated or co-extruded with a polymer barrier layer containing an additive that absorbs the photo-curing radiation. In yet another embodiment the plastic substrate contains an intrinsic additive that absorbs the photo-curing radiation. Combinations of these embodiments are also within the scope of this invention. The methods of the present invention may be advantageously applied to the fabrication of optical waveguides comprising a photo-curable polymer supported on a plastic substrate, but are applicable to the fabrication of any device or object comprising a photo-curable polymer supported on a plastic substrate.
Public/Granted literature
- US20120219771A1 Photolithographic Patterning of Polymeric Materials Public/Granted day:2012-08-30
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