发明授权
- 专利标题: Photolithographic patterning of polymeric materials
- 专利标题(中): 聚合材料的光刻图案化
-
申请号: US13315538申请日: 2011-12-09
-
公开(公告)号: US09176384B2公开(公告)日: 2015-11-03
- 发明人: Robert Charters , Dax Kukulj
- 申请人: Robert Charters , Dax Kukulj
- 申请人地址: US DE Wilmington
- 专利权人: ZETT RESEARCH AND DEVELOPMENT LLC—RPO SERIES
- 当前专利权人: ZETT RESEARCH AND DEVELOPMENT LLC—RPO SERIES
- 当前专利权人地址: US DE Wilmington
- 代理机构: Mattingly & Malur, PC
- 主分类号: B32B3/10
- IPC分类号: B32B3/10 ; G03F7/09 ; B32B15/085 ; B32B15/09 ; B32B15/20 ; B32B27/00 ; B32B27/18 ; B32B27/36 ; G02B6/122 ; G02B6/138 ; G03F7/11
摘要:
The invention comprises methods for the photolithographic patterning of features in a photo-curable polymer composition coated onto a plastic substrate. In one embodiment of this invention, the plastic substrate is coated with a reflective film such as a metallic barrier. In another embodiment, the plastic substrate is coated or co-extruded with a polymer barrier layer containing an additive that absorbs the photo-curing radiation. In yet another embodiment the plastic substrate contains an intrinsic additive that absorbs the photo-curing radiation. Combinations of these embodiments are also within the scope of this invention. The methods of the present invention may be advantageously applied to the fabrication of optical waveguides comprising a photo-curable polymer supported on a plastic substrate, but are applicable to the fabrication of any device or object comprising a photo-curable polymer supported on a plastic substrate.
公开/授权文献
- US20120219771A1 Photolithographic Patterning of Polymeric Materials 公开/授权日:2012-08-30
信息查询