Invention Grant
US09176385B2 Lithography methods, methods for forming patterning tools and patterning tools
有权
平版印刷方法，图案形成工具和图形工具的形成方法
- Patent Title: Lithography methods, methods for forming patterning tools and patterning tools
- Patent Title (中): 平版印刷方法，图案形成工具和图形工具的形成方法
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Application No.: US14107767Application Date: 2013-12-16
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Publication No.: US09176385B2Publication Date: 2015-11-03
- Inventor: Jianming Zhou , Scott L. Light , David Kewley , Prasanna Srinivasan , Anton deVilliers
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Schwegman Lundberg & Woessner, P.A.
- Main IPC: G03F1/44
- IPC: G03F1/44 ; G03F7/20 ; G03F1/26 ; G03F1/32
Abstract:
Methods of lithography, methods for forming patterning tools, and patterning tools are described. One such patterning tool include an active region that forms a first diffraction image on a lens when in use, and an inactive region that forms a second diffraction image on a lens when in use. The inactive region includes a pattern of phase shifting features formed in a substantially transparent material of the patterning tool. Patterning tools and methods, as described, can be used to compensate for lens distortion from effects such as localized heating.
Public/Granted literature
- US20140106280A1 LITHOGRAPHY METHODS, METHODS FOR FORMING PATTERNING TOOLS AND PATTERNING TOOLS Public/Granted day:2014-04-17
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