Invention Grant
US09176392B2 Lithographic apparatus and device manufacturing method using dose control
有权
平版印刷设备和使用剂量控制的器件制造方法
- Patent Title: Lithographic apparatus and device manufacturing method using dose control
- Patent Title (中): 平版印刷设备和使用剂量控制的器件制造方法
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Application No.: US14190147Application Date: 2014-02-26
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Publication No.: US09176392B2Publication Date: 2015-11-03
- Inventor: Kars Zeger Troost , Arno Jan Bleeker
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A system and method are used to manufacture a device using at least one exposure step. Each exposure step projects a patterned beam of radiation onto a substrate. The patterned beam includes a plurality of pixels. Each pixel delivers a radiation dose no greater than a predetermined normal maximum dose to the target portion in the exposure step and/or at least one selected pixel delivers an increased radiation dose, greater than the normal maximum dose. The increased dose may be delivered to compensate for the effect of a defective element at a known position in the array on a pixel adjacent a selected pixel or compensate for underexposure of the target portion at the location of a selected pixel resulting from exposure of that location to a pixel affected by a known defective element in another exposure step.
Public/Granted literature
- US20140176929A1 Lithographic Apparatus and Device Manufacturing Method Using Dose Control Public/Granted day:2014-06-26
Information query
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