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公开(公告)号：US10222702B2
公开(公告)日：2019-03-05
申请号：US15550855
申请日：2016-01-21
发明人： Arno Jan Bleeker , Ramon Mark Hofstra , Erik Petrus Buurman , Johannes Hubertus Josephina Moors , Alexander Matthijs Struycken , Harm-Jan Voorma , Sumant Sukdew Ramanujan Oemrawsingh , Markus Franciscus Antonius Eurlings , Peter Frans Maria Muys
摘要： A laser radiation source for a lithographic tool comprising a laser module to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength, a beam separation device to separate the optical paths of the first and second laser beams and substantially recombine the optical paths, a beam delivery system to direct the first and second laser beams to a fuel target and an optical isolation apparatus to: adjust the polarization state of the first laser beam, adjust the polarization state of the second laser beam and to block radiation having the adjusted polarization states such that the reflection of the first laser beam and the reflection of the second laser beam are substantially blocked from propagating towards the laser module.
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2.发明授权公开(公告)号：US09715183B2
公开(公告)日：2017-07-25
申请号：US14365549
申请日：2013-01-24
发明人： Wouter Dick Koek , Arno Jan Bleeker , Erik Roelof Loopstra , Heine Melle Mulder , Erwin John Van Zwet , Dries Smeets , Robert Paul Ebeling
CPC分类号： G03F7/70891 , G02B6/4296 , G03F7/7015 , G03F7/70275 , G03F7/70291 , G03F7/70391 , G03F7/704 , Y10T29/49
摘要： A device having a waveguide formed of a continuous body of material that is transparent to radiation that passes through the waveguide, wherein the body has an input surface and an output surface, and a cooler configured to cool the input surface and/or the output surface. An exposure apparatus having a programmable patterning device that comprises a plurality of radiation emitters, configured to provide a plurality of radiation beams; and a projection system, comprising a stationary part and a moving part, configured to project the plurality of radiation beams onto locations on a target that are selected based on a pattern, wherein at least one of the radiation emitters comprises a waveguide configured to output a radiation beam that comprises unpolarized and/or circularly polarized radiation.
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3.发明授权Lithography apparatus, a device manufacturing method, a method of manufacturing an attenuator 有权光刻设备，器件制造方法，衰减器的制造方法公开(公告)号：US09594304B2
公开(公告)日：2017-03-14
申请号：US14382229
申请日：2013-02-05
IPC分类号： G03F7/20
CPC分类号： G03F7/20 , G03F7/70191 , G03F7/70275 , G03F7/70291 , G03F7/70391 , G03F7/704
摘要： There is disclosed an exposure apparatus, a device manufacturing method and a method of manufacturing an attenuator. According to an embodiment, the exposure apparatus includes a programmable patterning device configured to provide a plurality of individually controllable radiation beams; a projection system configured to project each of the radiation beams onto a respective location on a target; and an attenuator configured to reduce a standard deviation in maximum radiation flux or background exposure level that can be applied to the target by the radiation beams as a function of position on the target.
摘要翻译： 公开了一种曝光装置，装置制造方法和衰减器的制造方法。 根据实施例，曝光装置包括可编程图案形成装置，其被配置为提供多个可单独控制的辐射束; 投影系统，被配置为将每个辐射束投射到目标上的相应位置; 以及衰减器，其被配置为减少可以作为靶上的位置的函数的辐射束可以施加到目标的最大辐射通量或背景曝光水平的标准偏差。
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4.发明申请DEVICE, LITHOGRAPHIC APPARATUS, METHOD FOR GUIDING RADIATION AND DEVICE MANUFACTURING METHOD 有权设备，光刻设备，用于引导辐射的方法和设备制造方法公开(公告)号：US20140347641A1
公开(公告)日：2014-11-27
申请号：US14365549
申请日：2013-01-24
发明人： Wouter Dick Koek , Arno Jan Bleeker , Erik Roelof Loopstra , Heine Melle Mulder , Erwin John Van Zwet , Dries Smeets , Robert Paul Ebeling
IPC分类号： G03F7/20
CPC分类号： G03F7/70891 , G02B6/4296 , G03F7/7015 , G03F7/70275 , G03F7/70291 , G03F7/70391 , G03F7/704 , Y10T29/49
摘要： A device having a waveguide formed of a continuous body of material that is transparent to radiation that passes through the waveguide, wherein the body has an input surface and an output surface, and a cooler configured to cool the input surface and/or the output surface. An exposure apparatus having a programmable patterning device that comprises a plurality of radiation emitters, configured to provide a plurality of radiation beams; and a projection system, comprising a stationary part and a moving part, configured to project the plurality of radiation beams onto locations on a target that are selected based on a pattern, wherein at least one of the radiation emitters comprises a waveguide configured to output a radiation beam that comprises unpolarized and/or circularly polarized radiation.
摘要翻译： 一种具有波导形成的波导的器件，所述波导由穿过所述波导的辐射透明的材料的连续体形成，其中所述主体具有输入表面和输出表面，以及冷却器，被配置为冷却所述输入表面和/或输出表面 。 一种具有可编程图案形成装置的曝光装置，包括多个辐射发射器，被配置为提供多个辐射束; 以及投影系统，包括固定部分和移动部分，其被配置为将所述多个辐射束投影到基于图案被选择的目标上的位置上，其中所述辐射发射器中的至少一个包括波导，所述波导被配置为输出 包括非偏振和/或圆偏振辐射的辐射束。
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公开(公告)号：US20140055788A1
公开(公告)日：2014-02-27
申请号：US14011663
申请日：2013-08-27
发明人： Arie Jeffrey Maria DEN BOEF , Arno Jan Bleeker , Youri Johannes Laurentius Maria Van Dommelen , Mircea Dusa , Antoine Gaston Marie Kiers , Paul Frank Luehrmann , Henricus Petrus Maria Pellemans , Maurits Van Der Schaar , Cedric Desire Grouwstra , Markus Gerardus Martinus Van Kraaij
IPC分类号： G03F7/20
CPC分类号： G01N21/8806 , G03F7/70341 , G03F7/70633 , G03F7/7065 , G03F9/7034
摘要： An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.
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公开(公告)号：US11942302B2
公开(公告)日：2024-03-26
申请号：US17361119
申请日：2019-12-17
发明人： Arno Jan Bleeker , Pieter Willem Herman De Jager , Maikel Robert Goosen , Erwin Paul Smakman , Albertus Victor Gerardus Mangnus , Yan Ren , Adam Lassise
IPC分类号： H01J37/09 , H01J37/147 , H01J37/244 , H01J37/26 , H01J37/28
CPC分类号： H01J37/1474 , H01J37/244 , H01J37/265 , H01J37/28 , H01J2237/24475 , H01J2237/2448 , H01J2237/2817
摘要： Apparatuses and methods for charged-particle detection may include a deflector system configured to direct charged-particle pulses, a detector having a detection element configured to detect the charged-particle pulses, and a controller having a circuitry configured to control the deflector system to direct a first and second charged-particle pulses to the detection element; obtain first and second timestamps associated with when the first charged-particle pulse is directed by the deflector system and detected by the detection element, respectively, and third and fourth timestamps associated with when the second charged-particle pulse is directed by the deflector system and detected by the detection element, respectively; and identify a first and second exiting beams based on the first and second timestamps, and the third and fourth timestamps, respectively.
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公开(公告)号：US10955353B2
公开(公告)日：2021-03-23
申请号：US16270155
申请日：2019-02-07
发明人： Arie Jeffrey Den Boef , Arno Jan Bleeker , Youri Johannes Laurentius Maria Van Dommelen , Mircea Dusa , Antoine Gaston Marie Kiers , Paul Frank Luehrmann , Henricus Petrus Maria Pellemans , Maurits Van Der Schaar , Cedric Desire Grouwstra , Markus Gerardus Martinus Maria Van Kraaij
摘要： An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.
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公开(公告)号：US11525786B2
公开(公告)日：2022-12-13
申请号：US17192276
申请日：2021-03-04
发明人： Arie Jeffrey Den Boef , Arno Jan Bleeker , Youri Johannes Laurentius Maria Van Dommelen , Mircea Dusa , Antoine Gaston Marie Kiers , Paul Frank Luehrmann , Henricus Petrus Maria Pellemans , Maurits Van Der Schaar , Cédric Désiré Grouwstra , Markus Gerardus Martinus Maria Van Kraaij
摘要： An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.
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公开(公告)号：US09696636B2
公开(公告)日：2017-07-04
申请号：US14350327
申请日：2012-11-06
CPC分类号： G03F7/70558 , G03F7/70191 , G03F7/70275 , G03F7/70291 , G03F7/70308 , G03F7/70391 , G03F7/705 , G03F7/70508 , G03F7/70525 , G03F9/7026
摘要： The invention relates to intensity values for a plurality of beams used to irradiate a plurality of locations on a target are determined with reference to the position and/or rotation of the locations. Also provided is an associated lithographic or exposure apparatus, an associated device manufacturing method and an associated computer program.
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公开(公告)号：US09341960B2
公开(公告)日：2016-05-17
申请号：US14356124
申请日：2012-11-14
CPC分类号： G03F7/70425 , G02B27/126 , G03F7/70275 , G03F7/70291 , G03F7/70391 , G03F7/704
摘要： An exposure apparatus having a projection system configured to project a plurality of radiation beams onto a target and an image slicer. The image slicer is arranged in an inverted configuration such that, if an input image formed of a plurality of separated image regions were provided to the image slicer, it would output an output image formed from the plurality of image regions, each arranged to adjoin an adjacent image region. The exposure apparatus is configured such that each of the radiation beams is input into the image slicer at a location corresponding to a respective one of the separated image regions.
摘要翻译： 具有投影系统的曝光装置，其配置为将多个辐射束投射到目标物和图像限幅器上。 图像限幅器被布置成反向配置，使得如果由多个分离的图像区域形成的输入图像被提供给图像限幅器，则其将输出由多个图像区域形成的输出图像，每个图像区域布置成邻接 相邻图像区域。 曝光装置被配置为使得每个辐射束在对应于分离的图像区域中的相应一个的位置处被输入到图像限幅器中。
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