Invention Grant
- Patent Title: Lithographic apparatus and a method of operating the apparatus
- Patent Title (中): 光刻设备和操作该设备的方法
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Application No.: US12472099Application Date: 2009-05-26
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Publication No.: US09176393B2Publication Date: 2015-11-03
- Inventor: Christian Gerardus Norbertus Hendricus Marie Cloin , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Marco Koert Stavenga , Erik Henricus Egidius Catharina Eummelen , Michel Riepen , Olga Vladimirovna Elisseeva , Tijmen Wilfred Mathijs Gunther , Michaël Christiaan Van Der Wekken
- Applicant: Christian Gerardus Norbertus Hendricus Marie Cloin , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Marco Koert Stavenga , Erik Henricus Egidius Catharina Eummelen , Michel Riepen , Olga Vladimirovna Elisseeva , Tijmen Wilfred Mathijs Gunther , Michaël Christiaan Van Der Wekken
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.
Public/Granted literature
- US20090296065A1 LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS Public/Granted day:2009-12-03
Information query
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