Patent search ap:"Nicolaas Ten Kate" Page 1

1.

发明授权
Lithographic apparatus and device manufacturing method involving a heater and a temperature sensor 有权
Title translation: 涉及加热器和温度传感器的平版印刷设备和设备制造方法

公开(公告)号：US09268242B2

公开(公告)日：2016-02-23

申请号：US12869560

申请日：2010-08-26

Applicant: Theodorus Petrus Maria Cadee , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Aschwin Lodewijk Hendricus Johannes Vermeer , Jeroen Johannes Sophia Maria Mertens , Christianus Gerardus Maria De Mol , Marcel Johannus Elisabeth Hubertus Muitjens , Antonius Johannus Van Der Net , Joost Jeroen Ottens , Johannes Anna Quaedackers , Mana Elisabeth Reuhman-Huisken , Marco Koert Stavenga , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Frans Pierre Smeets , Bart Leonard Peter Schoondermark , Franciscus Johannes Joseph Janssen , Michel Riepen

Inventor： Theodorus Petrus Maria Cadee , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Aschwin Lodewijk Hendricus Johannes Vermeer , Jeroen Johannes Sophia Maria Mertens , Christianus Gerardus Maria De Mol , Marcel Johannus Elisabeth Hubertus Muitjens , Antonius Johannus Van Der Net , Joost Jeroen Ottens , Johannes Anna Quaedackers , Mana Elisabeth Reuhman-Huisken , Marco Koert Stavenga , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Frans Pierre Smeets , Bart Leonard Peter Schoondermark , Franciscus Johannes Joseph Janssen , Michel Riepen

IPC: G03F7/20

CPC classification number: G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875

Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.

Abstract translation: 描述了一种光刻设备，其具有液体供应系统，其被配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间，布置成基本上容纳该空间内的液体的阻挡构件和加热器。

2.

发明授权
Lithographic apparatus and device manufacturing method 有权

公开(公告)号：US09097992B2

公开(公告)日：2015-08-04

申请号：US13186123

申请日：2011-07-19

Applicant: Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederick De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Martinus Hendrukus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Joost Jeroen Ottens , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelius Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Johannes Petrus Maria Smeulers , Stefan Philip Christiaan Belfroid , Herman Vogel

Inventor： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederick De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Martinus Hendrukus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Joost Jeroen Ottens , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelius Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Johannes Petrus Maria Smeulers , Stefan Philip Christiaan Belfroid , Herman Vogel

IPC: G03B27/52 , G03B27/42 , G03F7/20

CPC classification number: G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095

Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

3.

发明授权
Lithographic apparatus and device manufacturing method 有权
Title translation: 平版印刷设备和器件制造方法

公开(公告)号：US08958054B2

公开(公告)日：2015-02-17

申请号：US13184107

申请日：2011-07-15

Applicant: Marcel Beckers , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Ferdy Migchelbrink

Inventor： Marcel Beckers , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Ferdy Migchelbrink

IPC: G03B27/52 , G03B27/42 , G03F7/20

CPC classification number: G03F7/70341

Abstract: A protrusion is provided on a barrier member which at least partly confines a liquid between a projection system and a substrate. The protrusion is closer to the projection system than other parts of the barrier member to promote a meniscus of liquid to adhere between the protrusion and the projection system.

Abstract translation: 在阻挡构件上设置突起，所述阻挡构件至少部分地将液体限制在投影系统和基板之间。突起比屏障部件的其它部分更靠近投影系统，以促进液体的弯液面粘附在突起和投影系统之间。

4.

发明授权
Lithographic apparatus and a device manufacturing method 失效
Title translation: 光刻设备和器件制造方法

公开(公告)号：US08659742B2

公开(公告)日：2014-02-25

申请号：US12969635

申请日：2010-12-16

Applicant: Niek Jacobus Johannes Roset , Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre , Alexander Nikolov Zdravkov

Inventor： Niek Jacobus Johannes Roset , Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre , Alexander Nikolov Zdravkov

IPC: G03B27/52 , G03B27/42

CPC classification number: G03F7/70716 , G03F7/70341

Abstract: An immersion lithographic apparatus is disclosed that has a fluid handling system configured to provide immersion liquid between a final element of a projection system and a surface which includes, in cross-section, a feature, and has an adjustment fluid source configured to locally change the composition of the immersion liquid to cause a local decrease in surface tension of the immersion liquid at least when a meniscus of the immersion liquid contacts the feature.

Abstract translation: 公开了一种浸没式光刻设备，其具有流体处理系统，该流体处理系统构造成在投影系统的最终元件和包括横截面的特征之间提供浸没液体，并且具有调节流体源，该调整流体源被配置为局部地改变至少当浸没液体的弯月面接触该特征时，浸没液的组成导致浸液的表面张力局部降低。

5.

发明授权
Lithographic apparatus and device manufacturing method 有权

公开(公告)号：US08446563B2

公开(公告)日：2013-05-21

申请号：US12541755

申请日：2009-08-14

Applicant: Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Joost Jeroen Ottens , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Johannes Petrus Maria Smeulers , Stefan Philip Christiaan Belfroid , Herman Vogel

Inventor： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Joost Jeroen Ottens , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Johannes Petrus Maria Smeulers , Stefan Philip Christiaan Belfroid , Herman Vogel

IPC: G03B27/42 , G03B27/52

CPC classification number: G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095

Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

6.

发明授权
Immersion lithographic apparatus and device manufacturing method 失效
Title translation: 浸没式光刻设备及器件制造方法

公开(公告)号：US08405819B2

公开(公告)日：2013-03-26

申请号：US12775045

申请日：2010-05-06

Applicant: Laurentius Johannes Adrianus Van Bokhoven , Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre , Henricus Jozef Castelijns , Petrus Martinus Gerardus Johannes Arts

Inventor： Laurentius Johannes Adrianus Van Bokhoven , Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre , Henricus Jozef Castelijns , Petrus Martinus Gerardus Johannes Arts

IPC: G03B27/32 , G03B27/42 , G03B27/52 , G03B27/58

CPC classification number: G03F7/70716 , G03F7/70341

Abstract: In an all-wet immersion lithographic apparatus, the immersion liquid is allowed to flow off an edge of the substrate table. The immersion liquid is moved with the substrate table during exposure. The motion of the immersion liquid may result in a disturbance and/or de-wetting. A geometry of the substrate table is proposed that may reduce such a disturbance and/or de-wetting. The cross-sectional edge profile of the substrate table and/or the plan shape of the substrate table are considered.

Abstract translation: 在全湿式浸没式光刻设备中，允许浸没液体从衬底台的边缘流出。在曝光期间，浸没液体与衬底台一起移动。浸没液体的运动可能导致干扰和/或脱湿。提出了可以减少这种干扰和/或去湿的衬底台的几何形状。考虑衬底台的横截面边缘轮廓和/或衬底台的平面形状。

7.

发明申请
SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER 有权
Title translation: 基板支架，光刻装置，装置制造方法及制造基板支架的方法

公开(公告)号：US20120274920A1

公开(公告)日：2012-11-01

申请号：US13455870

申请日：2012-04-25

Applicant: Jan BEX , Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre , Johannes Wilhelmus Damen , Eugene Maria Brinkhof , Yogesh Pramod Karade

Inventor： Jan BEX , Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre , Johannes Wilhelmus Damen , Eugene Maria Brinkhof , Yogesh Pramod Karade

IPC: G03B27/58 , B05D3/00 , B05D5/12

CPC classification number: G03F7/70708 , G03F7/70716 , G03F7/7085 , G03F7/70875

Abstract: A method of manufacturing a substrate holder for use in a lithographic apparatus, the method including providing a main body having a surface and a plurality of burls projecting from the surface and having end surfaces to support a substrate, providing a carrier surface adjacent the main body surface, and forming a conductive layer on at least part of the main body surface and an integral part on at least part of the carrier surface.

Abstract translation: 一种制造用于光刻设备的衬底保持器的方法，所述方法包括提供具有表面的主体和从所述表面突出的多个毛刺，并且具有端面以支撑衬底，提供邻近所述主体的载体表面表面，并且在主体表面的至少一部分上形成导电层，并在载体表面的至少一部分上形成整体部分。

8.

发明申请
SUBSTRATE TABLE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD 有权
Title translation: 基板，平面设备和设备制造方法

公开(公告)号：US20120154781A1

公开(公告)日：2012-06-21

申请号：US13329971

申请日：2011-12-19

Applicant: Nicolaas TEN KATE , Raymond Wilhelmus Louis LAFARRE

Inventor： Nicolaas TEN KATE , Raymond Wilhelmus Louis LAFARRE

IPC: G03B27/58

CPC classification number: G03F7/70716 , G03F7/70341

Abstract: A table for a lithographic apparatus, the table having a catchment opening formed in an upper surface of the table, the catchment opening in fluid communication through the table with the environment of the table at a drain opening in a surface of the table other than the upper surface.

Abstract translation: 一种用于光刻设备的工作台，该工作台具有形成在工作台的上表面中的集水开口，该容器开口通过工作台与桌子的环境流体连通，在桌子的表面的排水开口处，除了上表面。