发明授权
- 专利标题： Preventing contamination in integrated circuit manufacturing lines
- 专利标题（中）： 防止集成电路生产线上的污染
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申请号： US11771734申请日： 2007-06-29
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公开(公告)号： US09177843B2公开(公告)日： 2015-11-03
- 发明人: Chien-Ming Sung , Simon Wang , Jia-Ren Chen , Henry Lo , Chen-Hua Yu , Jean Wang , Kewei Zuo
- 申请人： Chien-Ming Sung , Simon Wang , Jia-Ren Chen , Henry Lo , Chen-Hua Yu , Jean Wang , Kewei Zuo
- 申请人地址： TW Hsin-Chu
- 专利权人： Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人： Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址： TW Hsin-Chu
- 代理机构： Slater & Matsil, L.L.P.
- 主分类号： H01L21/677
- IPC分类号： H01L21/677 ; H01L21/673 ; H01L21/67
摘要：
A semiconductor manufacturing line includes an inert environment selected from the group consisting essentially of an inert airtight wafer holder, an inert wafer transport channel, an inert production tool, an inert clean room, and combinations thereof.