Invention Grant
US09182672B2 System and method for production of nanostructures over large areas
有权
在大面积生产纳米结构的系统和方法
- Patent Title: System and method for production of nanostructures over large areas
- Patent Title (中): 在大面积生产纳米结构的系统和方法
-
Application No.: US13997335Application Date: 2011-12-20
-
Publication No.: US09182672B2Publication Date: 2015-11-10
- Inventor: Harun Solak , Francis Clube
- Applicant: Harun Solak , Francis Clube
- Applicant Address: CH Villigen/PSI
- Assignee: Eulitha AG
- Current Assignee: Eulitha AG
- Current Assignee Address: CH Villigen/PSI
- Agent Laurence A. Greenberg; Warner H. Stemer; Ralph E. Locher
- International Application: PCT/IB2011/055827 WO 20111220
- International Announcement: WO2012/085845 WO 20120628
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A method and an apparatus print a pattern of periodic features into a photosensitive layer. The methods includes the steps of: providing a substrate bearing the layer, providing a mask, arranging the substrate such that the mask has a tilt angle with respect to the substrate in a first plane orthogonal thereto, and providing collimated light for illuminating the mask pattern so as to generate a transmitted light-field composed of a range of transversal intensity distributions between Talbot planes separated by a Talbot distance so that the transmitted light-field has an intensity envelope in the first plane. The mask is illuminated with the light while displacing the substrate relative to the mask in a direction parallel to the first plane and to the substrate. The tilt angle and the intensity envelope are arranged so that the layer is exposed to an average of the range of transversal intensity distributions.
Public/Granted literature
- US20130323651A1 SYSTEM AND METHOD FOR PRODUCTION OF NANOSTRUCTURES OVER LARGE AREAS Public/Granted day:2013-12-05
Information query
IPC分类: