Invention Grant
- Patent Title: Composite charged particle beam apparatus and thin sample processing method
- Patent Title (中): 复合带电粒子束装置和薄样品处理方法
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Application No.: US14012019Application Date: 2013-08-28
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Publication No.: US09190243B2Publication Date: 2015-11-17
- Inventor: Tatsuya Asahata , Hidekazu Suzuki , Shota Torikawa
- Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION
- Applicant Address: JP
- Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
- Current Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
- Current Assignee Address: JP
- Agency: Adams & Wilks
- Priority: JP2012-190490 20120830; JP2013-174802 20130826
- Main IPC: H01J37/30
- IPC: H01J37/30 ; H01J37/02 ; H01J37/20 ; H01J37/28

Abstract:
A composite charged particle beam apparatus includes a FIB column for irradiating a thin sample with a FIB and a GIB column for irradiating the thin sample with a GIB. The thin sample is placed on a sample stage, and a tilt unit tilts the thin sample about a tilt axis of the sample stage, the tilt axis being orthogonal to the FIB irradiation axis and being located inside a plane formed by the FIB irradiation axis and the GIB irradiation axis. A tilt sample holder is mounted on the sample stage and fixes the thin sample such that a cross-sectional surface of the thin sample is tilted at a constant angle with respect to the GIB irradiation axis and the azimuth angle of the GIB column can be changed by rotation of the sample stage.
Public/Granted literature
- US20140061159A1 COMPOSITE CHARGED PARTICLE BEAM APPARATUS AND THIN SAMPLE PROCESSING METHOD Public/Granted day:2014-03-06
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