Invention Grant
US09196364B2 Nonvolatile memory device having split ground selection line structures
有权
具有分割地选择线结构的非易失性存储器件
- Patent Title: Nonvolatile memory device having split ground selection line structures
- Patent Title (中): 具有分割地选择线结构的非易失性存储器件
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Application No.: US14244930Application Date: 2014-04-04
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Publication No.: US09196364B2Publication Date: 2015-11-24
- Inventor: Minsu Kim , Yang-Lo Ahn , Dae Han Kim , Kitae Park
- Applicant: Minsu Kim , Yang-Lo Ahn , Dae Han Kim , Kitae Park
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Volentine & Whitt, PLLC
- Priority: KR10-2013-0059855 20130527
- Main IPC: G11C16/04
- IPC: G11C16/04 ; G11C16/08 ; G11C16/34

Abstract:
A nonvolatile memory device includes a plurality of vertical NAND flash memory cells arranged in a three dimensional (3D) structure, a first memory block disposed in the 3D structure and having memory cells selected by a first ground selection line and a second ground selection line, wherein the first and second ground selection lines are electrically separated from each other, a second memory block disposed in the 3D structure and having memory cells selected by a third selection line and fourth selection line, wherein the third and fourth ground selection lines are electrically separated from each other, and a pass transistor that transfers a driving signal to turn on ground selection transistors respectively connected to the first and third ground selection lines in response to a block selection signal.
Public/Granted literature
- US20140347927A1 NONVOLATILE MEMORY DEVICE HAVING SPLIT GROUND SELECTION LINE STRUCTURES Public/Granted day:2014-11-27
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