Invention Grant
- Patent Title: System and method for plasma monitoring using microwaves
- Patent Title (中): 使用微波等离子体监测的系统和方法
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Application No.: US13081680Application Date: 2011-04-07
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Publication No.: US09196463B2Publication Date: 2015-11-24
- Inventor: Kamal Hadidi
- Applicant: Kamal Hadidi
- Applicant Address: US MA Gloucester
- Assignee: Varian Semiconductor Equipment Associates, Inc.
- Current Assignee: Varian Semiconductor Equipment Associates, Inc.
- Current Assignee Address: US MA Gloucester
- Main IPC: G01R31/00
- IPC: G01R31/00 ; H01J37/32
Abstract:
A plasma detector system may include a high frequency generator arranged to send incident electromagnetic radiation through a plasma chamber of a plasma system; and a high frequency detection system arranged to detect signal intensity of high frequency radiation sent from the high frequency generator and transmitted through the plasma chamber.
Public/Granted literature
- US20120255491A1 SYSTEM AND METHOD FOR PLASMA MONITORING USING MICROWAVES Public/Granted day:2012-10-11
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