公开(公告)号：US10477665B2

公开(公告)日：2019-11-12

申请号：US13445947

申请日：2012-04-13

Applicant: Kamal Hadidi ,  Makhlouf Redjdal

Inventor： Kamal Hadidi ,  Makhlouf Redjdal

IPC: H05B6/64 ,  H05H1/30

Abstract: A microwave plasma torch providing two laminar flows is described. Two laminar flows are created using a set of at least three concentric, staggered dielectric tubes connected to a pressurized gas source. An inner laminar flow entrains injected particles entering the plasma. An outer laminar flow creates a sheath around the plasma and prevents it from attaching to the walls of the plasma torch. The entry point of the gas source is designed to ensure laminar flow for both the entrainment of the particles and for the shielding of the plasma plume. The uniform processing conditions results in uniform particles and a homogenous materials distribution. This enables a final product with improved thermal properties, improved corrosion and wear resistance and a higher tolerance to interface stresses. The microwave plasma torch can be used for producing nanomaterial powder and for spray coating materials onto various substrates.

公开(公告)号：US20130075253A1

公开(公告)日：2013-03-28

申请号：US13245035

申请日：2011-09-26

Applicant: Kamal Hadidi ,  George D. Papasouliotis ,  Craig R. Chaney

Inventor： Kamal Hadidi ,  George D. Papasouliotis ,  Craig R. Chaney

IPC: C23C14/46 ,  C23C14/34

CPC classification number: C23C14/564 ,  C23C16/4404 ,  H01J37/3171 ,  H01J37/32477 ,  H01J2237/0213 ,  H01J2237/08 ,  H01J2237/16

Abstract: An improved plasma processing chamber is disclosed, wherein some or all of the components which are exposed to the plasma are made of, or coated with, titanium diborane. Titanium diborane has a hardness in excess of 9 mhos, making it less susceptible to sputtering. In addition, titanium diborane is resistant to fluoride and chlorine ions. Finally, titanium diborane is electrically conductive, and therefore the plasma remains more uniform over time, as charge does not build on the surfaces of the titanium diborane components. This results in improved workpiece processing, with less contaminants and greater uniformity. In other embodiments, titanium diborane may be used to line components within a beam line implanter.

Abstract translation: 公开了一种改进的等离子体处理室，其中暴露于等离子体的部分或全部组分由钛乙硼烷制成或涂覆。 钛乙硼烷的硬度超过9毫摩尔，使其不易溅射。 此外，乙硼烷钛耐氟化物和氯离子。 最后，乙硼烷钛是导电的，因此随着时间的推移，等离子体保持更均匀，因为电荷不会在钛二硼烷组分的表面上形成。 这导致改进的工件加工，更少的污染物和更大的均匀性。 在其它实施方案中，可以使用乙硼烷钛来在束线注入机内引导组分。

公开(公告)号：US20120255491A1

公开(公告)日：2012-10-11

申请号：US13081680

申请日：2011-04-07

Applicant: Kamal Hadidi

Inventor： Kamal Hadidi

IPC: G01N21/00 ,  B05C11/00 ,  H01J7/00

CPC classification number: H01J37/32935

Abstract: A plasma detector system may include a high frequency generator arranged to send incident electromagnetic radiation through a plasma chamber of a plasma system; and a high frequency detection system arranged to detect signal intensity of high frequency radiation sent from the high frequency generator and transmitted through the plasma chamber.

Abstract translation: 等离子体检测器系统可以包括高频发生器，其布置成将入射的电磁辐射通过等离子体系统的等离子体室; 以及高频检测系统，被配置为检测从高频发生器发送并通过等离子体室传输的高频辐射的信号强度。

公开(公告)号：US09196463B2

公开(公告)日：2015-11-24

申请号：US13081680

申请日：2011-04-07

Applicant: Kamal Hadidi

Inventor： Kamal Hadidi

IPC: G01R31/00 ,  H01J37/32

CPC classification number: H01J37/32935

Abstract: A plasma detector system may include a high frequency generator arranged to send incident electromagnetic radiation through a plasma chamber of a plasma system; and a high frequency detection system arranged to detect signal intensity of high frequency radiation sent from the high frequency generator and transmitted through the plasma chamber.

Abstract translation: 等离子体检测器系统可以包括高频发生器，其布置成将入射的电磁辐射通过等离子体系统的等离子体室; 以及高频检测系统，被配置为检测从高频发生器发送并通过等离子体室传输的高频辐射的信号强度。

公开(公告)号：US20140217630A1

公开(公告)日：2014-08-07

申请号：US14208955

申请日：2014-03-13

Applicant: Makhlouf Redjdal ,  Kamal Hadidi

Inventor： Makhlouf Redjdal ,  Kamal Hadidi

IPC: B01J19/12

CPC classification number: B01J19/126 ,  C01B13/34 ,  C01F7/162 ,  C01F17/0025 ,  C01P2002/02 ,  C01P2002/72 ,  C01P2004/03 ,  C01P2004/32 ,  C01P2004/61 ,  C04B35/44 ,  C04B35/443 ,  C04B35/6263 ,  C04B35/62665 ,  C04B35/645 ,  C04B35/6455 ,  C04B2235/3222 ,  C04B2235/3224 ,  C04B2235/3225 ,  C04B2235/528 ,  C04B2235/764

Abstract: Disclosed herein is a method to produce multiphase composite materials directly from solution precursor droplets by a fast pyrolysis process using a microwave plasma embodiment containing a microwave generating source, a dielectric plasma torch, and a droplet maker. Here, using homogenous solution precursors, droplets are generated with a narrow size distribution, and are injected and introduced into the microwave plasma torch with generally uniform thermal path. The generally uniform thermal path in the torch is achieved by axial injection of droplets into an axisymmetric hot zone with laminar flows. Upon exposing to high temperature within the plasma with controlled residence time, the droplets are pyrolyzed and converted into particles by quenching with a controlled rate of the exhaust gas in a gas chamber. The particles generated have generally uniform sizes and uniform thermal history, and can be used for a variety of applications.

Abstract translation: 本文公开了一种通过使用包含微波发生源，介电等离子体焰炬和液滴制造器的微波等离子体实施例的快速热解法直接从溶液前驱体液滴产生多相复合材料的方法。 在这里，使用均匀的溶液前体，产生具有窄尺寸分布的液滴，并注入并引入具有大致均匀热路径的微波等离子体焰炬中。 通过将液滴轴向注入到具有层流的轴对称热区域中，可实现手电筒中大致均匀的热路径。 当以受控的停留时间暴露于等离子体内的高温时，液滴被热解并通过在气室中以受控的排气速率淬火而转化为颗粒。 产生的颗粒具有大致均匀的尺寸和均匀的热历史，并可用于各种应用。

公开(公告)号：US20120000606A1

公开(公告)日：2012-01-05

申请号：US12829497

申请日：2010-07-02

Applicant: Rajesh Dorai ,  Kamal Hadidi ,  Mayur Jagtap

Inventor： Rajesh Dorai ,  Kamal Hadidi ,  Mayur Jagtap

IPC: C23F1/08 ,  C23C16/50 ,  H05B31/02 ,  C23C16/458

CPC classification number: H01J37/32633 ,  H01J37/32412 ,  H01J37/32532

Abstract: A plasma processing tool comprises a plasma chamber configured to generate a plasma from a gas introduced into the chamber where the generated plasma has an electron plasma frequency. A plurality of electrodes disposed within the chamber. Each of the electrodes configured to create a rapidly-rising-electric-field pulse in a portion of the plasma contained in the chamber. Each of said rapidly-rising-electric-field pulses having a rise time substantially equal to or less than the inverse of the electron plasma frequency and a duration of less than the inverse of the ion plasma frequency. In this manner, the electron energy distribution in the generated plasma may be spatially and locally modified thereby affecting the density, composition and temperature of the species in the plasma and consequently the uniformity of the density and composition of ions and neutrals directed at a target substrate.

Abstract translation: 等离子体处理工具包括等离子体室，其被配置为从引入室中的气体产生等离子体，其中产生的等离子体具有电子等离子体频率。 设置在室内的多个电极。 每个电极被配置为在腔室中包含的等离子体的一部分中产生快速上升的电场脉冲。 所述快速上升电场脉冲中的每一个具有基本上等于或小于电子等离子体频率的倒数的上升时间和小于离子等离子体频率的倒数的持续时间。 以这种方式，所产生的等离子体中的电子能量分布可以在空间上和局部改变，从而影响等离子体中物质的密度，组成和温度，从而影响靶向靶基质的离子和中性粒子的密度和组成的均匀性 。

公开(公告)号：US07105808B2

公开(公告)日：2006-09-12

申请号：US10865548

申请日：2004-06-10

Applicant: Leslie Bromberg ,  Kamal Hadidi ,  Daniel R. Cohen

Inventor： Leslie Bromberg ,  Kamal Hadidi ,  Daniel R. Cohen

IPC: B01D59/44 ,  H01J49/00

CPC classification number: G01N27/622 ,  H01J49/0031

Abstract: Ion mobility spectrometer. The spectrometer includes an enclosure for receiving a sample therewithin and an electron beam window admits an electron beam into the enclosure to ionize the sample in an ionization region. A shutter grid is spaced apart from the ionization region and means are provided for sample ion preconcentration upstream of the shutter grid. The ion preconcentration is effective to reduce space charge resulting in a lowered threshold detection level.

Abstract translation: 离子迁移谱仪。 光谱仪包括用于在其中接收样品的外壳，并且电子束窗口允许电子束进入外壳以使离子化区域中的样品离子化。 快门栅格与离子化区域间隔开，并且提供用于在快门栅格上游的样品离子预浓缩的装置。 离子预浓缩有效减少空间电荷，导致阈值检测水平降低。

公开(公告)号：US20050205775A1

公开(公告)日：2005-09-22

申请号：US10865548

申请日：2004-06-10

Applicant: Leslie Bromberg ,  Kamal Hadidi ,  Daniel Cohn

Inventor： Leslie Bromberg ,  Kamal Hadidi ,  Daniel Cohn

IPC: H01J49/28 ,  H01J49/40

CPC classification number: G01N27/622 ,  H01J49/0031

Abstract: Ion mobility spectrometer. The spectrometer includes an enclosure for receiving a sample therewithin and an electron beam window admits an electron beam into the enclosure to ionize the sample in an ionization region. A shutter grid is spaced apart from the ionization region and means are provided for sample ion preconcentration upstream of the shutter grid. The ion preconcentration is effective to reduce space charge resulting in a lowered threshold detection level.

Abstract translation: 离子迁移谱仪。 光谱仪包括用于在其中接收样品的外壳，并且电子束窗口允许电子束进入外壳以使离子化区域中的样品离子化。 快门栅格与离子化区域间隔开，并且提供用于在快门栅格上游的样品离子预浓缩的装置。 离子预浓缩有效减少空间电荷，导致阈值检测水平降低。

公开(公告)号：US09123509B2

公开(公告)日：2015-09-01

申请号：US13157005

申请日：2011-06-09

Applicant: George D. Papasouliotis ,  Kamal Hadidi ,  Helen L. Maynard ,  Ludovic Godet ,  Vikram Singh ,  Timothy J. Miller ,  Bernard Lindsay

Inventor： George D. Papasouliotis ,  Kamal Hadidi ,  Helen L. Maynard ,  Ludovic Godet ,  Vikram Singh ,  Timothy J. Miller ,  Bernard Lindsay

IPC: H01J37/32

CPC classification number: H01J37/32146 ,  H01J37/32412 ,  H01J37/3244

Abstract: Techniques for plasma processing a substrate are disclosed. In one particular exemplary embodiment, the technique may be realized with a method comprising introducing a feed gas proximate to a plasma source, where the feed gas may comprise a first and second species, where the first and second species have different ionization energies; providing a multi-level RF power waveform to the plasma source, where the multi-level RF power waveform has at least a first power level during a first pulse duration and a second power level during a second pulse duration, where the second power level may be different from the first power level; ionizing the first species of the feed gas during the first pulse duration; ionizing the second species during the second pulse duration; and providing a bias to the substrate during the first pulse duration.

Abstract translation: 公开了用于等离子体处理衬底的技术。 在一个特定的示例性实施例中，该技术可以通过包括将进料气体接近等离子体源的方法来实现，其中进料气体可以包括第一和第二物质，其中第一和第二物质具有不同的电离能; 向所述等离子体源提供多级RF功率波形，其中所述多级RF功率波形在第一脉冲持续时间期间具有至少第一功率电平，并且在第二脉冲持续时间期间具有第二功率电平，其中所述第二功率电平可以 与第一功率水平不同; 在第一脉冲持续期间电离原料气体的第一种; 在第二脉冲期间电离第二物种; 以及在所述第一脉冲持续时间期间向所述衬底提供偏置。

公开(公告)号：US08664561B2

公开(公告)日：2014-03-04

申请号：US12496080

申请日：2009-07-01

Applicant: Kamal Hadidi ,  Rajesh Dorai ,  Bernard G. Lindsay ,  Vikram Singh ,  George D. Papasouliotis

Inventor： Kamal Hadidi ,  Rajesh Dorai ,  Bernard G. Lindsay ,  Vikram Singh ,  George D. Papasouliotis

IPC: B23K10/00

CPC classification number: C23C14/48 ,  H01J37/32412 ,  H01J37/32935

Abstract: A method is disclosed for adjusting the composition of plasmas used in plasma doping, plasma deposition and plasma etching techniques. The disclosed method enables the plasma composition to be controlled by modifying the energy distribution of the electrons present in the plasma. Energetic electrons are produced in the plasma by accelerating electrons in the plasma using very fast voltage pulses. The pulses are long enough to influence the electrons, but too fast to affect the ions significantly. Collisions between the energetic electrons and the constituents of the plasma result in changes in the plasma composition. The plasma composition can then be optimized to meet the requirements of the specific process being used. This can entail changing the ratio of ion species in the plasma, changing the ratio of ionization to dissociation, or changing the excited state population of the plasma.

Abstract translation: 公开了一种用于调节用于等离子体掺杂，等离子体沉积和等离子体蚀刻技术的等离子体的组成的方法。 所公开的方法使得能够通过修改存在于等离子体中的电子的能量分布来控制等离子体组成。 通过使用非常快的电压脉冲加速等离子体中的电子，在等离子体中产生能量电子。 脉冲长度足以影响电子，但是太快而不能显着影响离子。 能量电子与等离子体成分之间的碰撞导致等离子体组成的变化。 然后可以优化等离子体组成以满足所使用的具体方法的要求。 这可能需要改变等离子体中的离子种类的比例，改变离子化与解离的比例，或改变等离子体的激发态群体。