Invention Grant
- Patent Title: Resistive memory and fabricating method thereof
- Patent Title (中): 电阻记忆及其制造方法
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Application No.: US13849422Application Date: 2013-03-22
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Publication No.: US09196828B2Publication Date: 2015-11-24
- Inventor: Ming-Hsiu Lee , Wei-Chih Chien
- Applicant: MACRONIX International Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: MACRONIX International Co., Ltd.
- Current Assignee: MACRONIX International Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: J.C. Patents
- Main IPC: H01L45/00
- IPC: H01L45/00 ; H01L27/24

Abstract:
A resistive memory and a fabricating method thereof are provided. The resistive memory includes first and second electrodes, a variable resistance material layer, a first dielectric layer, and a second dielectric layer. The first electrode includes a first portion and a second portion. The second electrode is disposed opposite to the first electrode. The variable resistance material layer includes a sidewall and first and second surfaces opposite to each other, wherein the first surface is connected with the first portion of the first electrode and the second surface is electrically connected with the second electrode. The second portion surrounds the sidewall of the variable resistance material layer and is connected with the first portion. The first dielectric layer is disposed between the first and the second electrodes. The second dielectric layer is disposed between the variable resistance material layer and the second portion of the first electrode.
Public/Granted literature
- US20130341583A1 RESISTIVE MEMORY AND FABRICATING METHOD THEREOF Public/Granted day:2013-12-26
Information query
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