Invention Grant
US09201195B2 Method and structure for reducing light crosstalk in integrated circuit device
有权
降低集成电路器件中的光串扰的方法和结构
- Patent Title: Method and structure for reducing light crosstalk in integrated circuit device
- Patent Title (中): 降低集成电路器件中的光串扰的方法和结构
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Application No.: US13930717Application Date: 2013-06-28
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Publication No.: US09201195B2Publication Date: 2015-12-01
- Inventor: Allen Tseng , Che-Min Lin , Zen-Fong Huang , Volume Chien , Chi-Cherng Jeng
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: G02B6/30
- IPC: G02B6/30 ; G02B6/32 ; G02B6/12 ; H01L27/146 ; G02B27/00 ; G02B5/20

Abstract:
The present disclosure provides an integrated circuit device comprising a substrate having a back surface and a sensing region disposed in the substrate and being operable to sense radiation projected towards the back surface of the substrate. The device further includes a waveguide disposed over the back surface of the substrate. The waveguide is aligned with the sensing region such that the waveguide is operable to transmit the radiation towards the aligned sensing region. The waveguide includes a waveguide wall, and an inner region disposed adjacent to the waveguide wall. A diffractive index of the waveguide wall is less than a diffractive index of the inner region.
Public/Granted literature
- US20150003777A1 Method and Structure for Reducing Light Crosstalk in Integrated Circuit Device Public/Granted day:2015-01-01
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