Invention Grant
US09201990B2 Simulation method, simulation program, recording medium having the simulation program stored therein, method for producing droplet arrangement patterns utilizing the simulation method, nanoimprinting method, method for producing patterned substrates, and ink jet apparatus
有权
模拟方法，仿真程序，其中存储有模拟程序的记录介质，利用该模拟方法产生液滴排列图案的方法，纳米压印方法，图案化基板的制造方法和喷墨设备
- Patent Title: Simulation method, simulation program, recording medium having the simulation program stored therein, method for producing droplet arrangement patterns utilizing the simulation method, nanoimprinting method, method for producing patterned substrates, and ink jet apparatus
- Patent Title (中): 模拟方法，仿真程序，其中存储有模拟程序的记录介质，利用该模拟方法产生液滴排列图案的方法，纳米压印方法，图案化基板的制造方法和喷墨设备
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Application No.: US14038268Application Date: 2013-09-26
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Publication No.: US09201990B2Publication Date: 2015-12-01
- Inventor: Satoshi Wakamatsu , Takeshi Unemura , Kenichi Kodama , Takafumi Noguchi
- Applicant: FUJIFILM CORPORATION
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2011-078727 20110331
- Main IPC: B44C1/22
- IPC: B44C1/22 ; G06F17/50 ; G03F7/00 ; B82Y10/00 ; B82Y40/00
Abstract:
A simulation method predicts wet spreading and unions of a plurality of droplets arranged on a patterned surface defined by a fine pattern of protrusions and recesses, the patterned surface causing anisotropy to occur in the wet spreading of the droplets. The influence imparted by the pattern of protrusions and recesses that defines the patterned surface, which is the target of analysis, on the wet spreading of the droplets is treated as wetting properties of an analysis surface, and the wet spreading and unions of the plurality of droplets on the analysis surface are analyzed by gas liquid two phase flow analysis that incorporates the wetting property parameters that represents the wetting properties.
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