Invention Grant
- Patent Title: Apparatus for adjusting aperture using microelectrofluidic method
- Patent Title (中): 使用微电流法调节孔径的装置
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Application No.: US14149235Application Date: 2014-01-07
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Publication No.: US09207448B2Publication Date: 2015-12-08
- Inventor: Kyu-dong Jung , Jong-hyeon Chang , Seung-wan Lee , Eun-sung Lee , Min-seog Choi
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2013-0001783 20130107
- Main IPC: G02B26/02
- IPC: G02B26/02 ; G02B26/00 ; G02B5/00

Abstract:
Provided is an aperture adjusting apparatus for adjusting an aperture through which light transmits. The aperture adjusting apparatus includes: a chamber configured to have space in which fluid flows, the chamber including a lower channel, an upper channel, and a plurality of reservoir regions connecting the lower channel and the upper channel and each having a non-uniform width crossing a flow direction of a fluid to form a space in which fluid flows; a photo-interceptive first fluid and a photo-transmissive second fluid having a property that the photo-transmissive second fluid does not mix with the first fluid and that are prepared in the chamber; and a first electrode unit in which one or more electrodes to which a voltage is applied are arrayed to form an electric field in the chamber, wherein an aperture through which light transmits is adjusted by a location change of an interface between the first fluid and the second fluid according to the electric field.
Public/Granted literature
- US20140192218A1 APPARATUS FOR ADJUSTING APERTURE USING MICROELECTROFLUIDIC METHOD Public/Granted day:2014-07-10
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