Invention Grant
- Patent Title: Light emitting device and method of manufacturing the same
- Patent Title (中): 发光元件及其制造方法
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Application No.: US14550815Application Date: 2014-11-21
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Publication No.: US09209223B2Publication Date: 2015-12-08
- Inventor: Jong Lam Lee , Jae Ho Lee , Yeo Jin Yoon , Eu Jin Hwang , Dae Won Kim
- Applicant: Seoul Viosys Co., Ltd.
- Applicant Address: KR Ansan-si
- Assignee: Seoul Viosys Co., Ltd.
- Current Assignee: Seoul Viosys Co., Ltd.
- Current Assignee Address: KR Ansan-si
- Agency: H.C. Park & Associates, PLC
- Priority: KR10-2005-0053797 20050622; KR10-2005-0055179 20050624; KR10-2006-0021801 20060308
- Main IPC: H01L33/00
- IPC: H01L33/00 ; H01L27/15 ; H01L33/08 ; H01L33/24 ; H01L33/32 ; H01L33/20 ; H01L33/38 ; H01L33/44 ; H01L27/32 ; H01L33/28 ; H01L51/52

Abstract:
The present invention relates to a light emitting device. The light emitting device comprises a substrate, an N-type semiconductor layer formed on the substrate, and a P-type semiconductor layer formed on the N-type semiconductor layer, wherein a side surface including the N-type or P-type semiconductor layer has a slope of 20° to 80° from a horizontal plane. Further, a light emitting device comprises a substrate formed with a plurality of light emitting cells each including an N-type semiconductor layer and a P-type semiconductor layer formed on the N-type semiconductor layer, wherein the N-type semiconductor layer of one light emitting cell and the P-type semiconductor layer of another adjacent light emitting cell are connected to each other, and a side surface including at least the P-type semiconductor layer of the light emitting cell has a slope of 20° to 80° from a horizontal plane.
Public/Granted literature
- US20150102367A1 LIGHT EMITTING DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2015-04-16
Information query
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