Invention Grant
- Patent Title: Asymmetric overlap and suspended shutter structure
- Patent Title (中): 不对称重叠和悬挂快门结构
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Application No.: US13745408Application Date: 2013-01-18
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Publication No.: US09213182B2Publication Date: 2015-12-15
- Inventor: Jianru Shi
- Applicant: Pixtronix, Inc.
- Applicant Address: US CA San Diego
- Assignee: Pixtronix, Inc.
- Current Assignee: Pixtronix, Inc.
- Current Assignee Address: US CA San Diego
- Agency: Weaver Austin Villeneuve & Sampson, LLP
- Main IPC: G02B26/02
- IPC: G02B26/02 ; G06T1/00 ; B81B3/00 ; G02B27/00

Abstract:
Systems and methods for displays that have a moveable shutter formed on a substrate having an aperture. The shutter, in at least one position, is asymmetrically aligned over the aperture. The asymmetric alignment provides an overlap between shutter and the substrate on one side of the aperture that is larger than an overlap between the shutter and the substrate on another side of the aperture. Typically, the larger overlap increases the ability of the shutter to reduce light passing through the aperture when then shutter is the in the at least one position.
Public/Granted literature
- US20140204096A1 ASYMMETRIC OVERLAP AND SUSPENDED SHUTTER STRUCTURE Public/Granted day:2014-07-24
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