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US09214353B2 Systems and methods for laser splitting and device layer transfer 有权
用于激光分裂和器件层转移的系统和方法

Systems and methods for laser splitting and device layer transfer
Abstract:
Methods and systems are provided for the split and separation of a layer of desired thickness of crystalline semiconductor material containing optical, photovoltaic, electronic, micro-electro-mechanical system (MEMS), or optoelectronic devices, from a thicker donor wafer using laser irradiation.
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