发明授权
- 专利标题: Bypass diode
- 专利标题(中): 旁路二极管
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申请号: US14357318申请日: 2012-10-29
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公开(公告)号: US09214573B2公开(公告)日: 2015-12-15
- 发明人: Keiji Shimada
- 申请人: Keiji Shimada
- 申请人地址: unknown Osaka-shi, Osaka
- 专利权人: Sharp Kabushiki Kaisha
- 当前专利权人: Sharp Kabushiki Kaisha
- 当前专利权人地址: unknown Osaka-shi, Osaka
- 代理机构: Nixon & Vanderhye, P.C.
- 优先权: JP2011-245373 20111109
- 国际申请: PCT/JP2012/077869 WO 20121029
- 国际公布: WO2013/069492 WO 20130516
- 主分类号: H01L29/861
- IPC分类号: H01L29/861 ; H01L23/00 ; H01L27/142 ; H01L29/06 ; H01L29/417 ; H01L29/66 ; H01L31/05 ; H01L31/0443
摘要:
A bypass diode includes a semiconductor substrate having a first surface and a second surface opposite to each other, a p electrode as a first conductive type electrode and an n electrode as a second conductive type electrode arranged on the first surface, a back surface electrode arranged on the second surface and having a polarity identical to that of the semiconductor substrate, a first oxide layer arranged on the first surface, and a second oxide layer arranged on the second surface.
公开/授权文献
- US20140353806A1 BYPASS DIODE 公开/授权日:2014-12-04
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