Invention Grant
- Patent Title: Gas gauge compatible with vacuum environments
- Patent Title (中): 气体表与真空环境兼容
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Application No.: US14102667Application Date: 2013-12-11
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Publication No.: US09222847B2Publication Date: 2015-12-29
- Inventor: Geoffrey Alan Schultz
- Applicant: ASML Holding N.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Holding N.V.
- Current Assignee: ASML Holding N.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G01L13/02 ; G01B13/12 ; G03F9/00

Abstract:
In one embodiment of the present invention, there is provided a gas gauge for use in a vacuum environment having a measurement gas flow channel. The gas gauge may comprise a measurement nozzle in the measurement gas flow channel. The measurement nozzle may be configured to operate at a sonically choked flow condition of a volumetric flow being sourced from a gas supply coupled to the measurement gas flow channel. The gas gauge may further comprise a pressure sensor operatively coupled to the measurement gas flow channel downstream from the sonically choked flow condition of the volumetric flow to measure a differential pressure of the volumetric flow for providing an indication of a gap between a distal end of the measurement nozzle and a target surface proximal thereto.
Public/Granted literature
- US20140096614A1 Gas Gauge Compatible With Vacuum Environments Public/Granted day:2014-04-10
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