发明授权
- 专利标题： Microcontact printed films as an activation layer for selective atomic layer deposition
- 专利标题（中）： 微接触印刷膜作为选择性原子层沉积的活化层
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申请号： US13178969申请日： 2011-07-08
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公开(公告)号： US09223203B2公开(公告)日： 2015-12-29
- 发明人: Elina Färm , Seppo Lindroos , Mikko Ritala , Markku Leskelä
- 申请人： Elina Färm , Seppo Lindroos , Mikko Ritala , Markku Leskelä
- 申请人地址： NL Almere
- 专利权人： ASM INTERNATIONAL N.V.
- 当前专利权人： ASM INTERNATIONAL N.V.
- 当前专利权人地址： NL Almere
- 代理机构： Knobbe, Martens, Olson & Bear, LLP
- 主分类号： C23C16/00
- IPC分类号： C23C16/00 ; G03F7/00 ; C23C16/04 ; C23C16/06 ; C23C16/02 ; B82Y10/00 ; B82Y40/00
摘要：
The present application relates to methods of forming patterned thin films on a substrate. In some embodiments a first patterned layer may be deposited on a substrate by a imprint lithography technique, such as microcontact printing. A second layer of a desired composition is selectively deposited over the first patterned layer by a vapor phase deposition process, such as ALD or CVD.
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