发明授权
- 专利标题: Imprint lithography template
- 专利标题(中): 印刷光刻模板
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申请号: US14026775申请日: 2013-09-13
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公开(公告)号: US09227361B2公开(公告)日: 2016-01-05
- 发明人: Byung-Jin Choi , Yeong-Jun Choi , Kosta S. Selinidis , Steven C. Shackleton
- 申请人: Molecular Imprints, Inc.
- 申请人地址: US TX Austin
- 专利权人: Canon Nanotechnologies, Inc.
- 当前专利权人: Canon Nanotechnologies, Inc.
- 当前专利权人地址: US TX Austin
- 代理商 Cameron A. King
- 主分类号: B29C59/00
- IPC分类号: B29C59/00 ; B82Y10/00 ; B82Y40/00 ; G03F7/00
摘要:
Nano imprint lithography templates for purging of fluid during nano imprint lithography processes are described. The templates may include an inner channel and an outer channel. The inner channel constructed to provide fluid communication with a process gas supply to a region between the template and a substrate during the nano imprint lithography process. The outer channel constructed to evacuate fluid and/or confine fluid between the active area of template and the substrate.
公开/授权文献
- US20140008841A1 IMPRINT LITHOGRAPHY TEMPLATE 公开/授权日:2014-01-09
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