Invention Grant
- Patent Title: Peeling liquid for a resist
- Patent Title (中): 剥离液体用于抗蚀剂
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Application No.: US14093737Application Date: 2013-12-02
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Publication No.: US09229329B2Publication Date: 2016-01-05
- Inventor: Shi Shu , Lu Liu , Can Wang , Yonglian Qi , Guanbao Hui
- Applicant: Boe Technology Group Co., Ltd.
- Applicant Address: CN Beijing
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee Address: CN Beijing
- Agency: Kinney & Lange, P.A.
- Priority: CN201210523929 20121207
- Main IPC: G03F7/42
- IPC: G03F7/42 ; C11D11/00

Abstract:
The invention discloses a peeling liquid for a resist, which relates to an optical element and is used for removing the color resist and the protective layer on a color filter rapidly and efficiently. The peeling liquid for a color resist on a color filter comprises an alkali metal alkoxide with a mass percentage of 10-45%, an organic amine with a mass percentage of 10-30%, a surfactant with a mass percentage of 5-30%, a solvent with a mass percentage of 20-60%, and an alcohol with a mass percentage of 1-55% in terms of the peeling liquid for a resist with a mass percentage of 100%. The peeling liquid for a resist in invention is used for removing the color resist and the protective layer of the substandard product in a color filter.
Public/Granted literature
- US20140179583A1 PEELING LIQUID FOR A RESIST Public/Granted day:2014-06-26
Information query
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