发明授权
- 专利标题: Fabrication apparatus for fabricating a layer structure
- 专利标题(中): 制造层结构的制造装置
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申请号: US14117443申请日: 2012-05-15
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公开(公告)号: US09231212B2公开(公告)日: 2016-01-05
- 发明人: Christoph Rickers , Pieter Gijsbertus Maria Kruijt
- 申请人: Christoph Rickers , Pieter Gijsbertus Maria Kruijt
- 申请人地址: NL Eindhoven
- 专利权人: KONINKLIJKE PHILIPS N.V.
- 当前专利权人: KONINKLIJKE PHILIPS N.V.
- 当前专利权人地址: NL Eindhoven
- 代理商 Yuliya R. Mathis
- 优先权: EP11167068 20110523
- 国际申请: PCT/IB2012/052412 WO 20120515
- 国际公布: WO2012/160475 WO 20121129
- 主分类号: B32B3/00
- IPC分类号: B32B3/00 ; H01L51/00 ; H01L51/56 ; B23K26/36
摘要:
The invention relates to a fabrication apparatus for fabricating a layer structure comprising at least a patterned first layer on a substrate. A layer structure (6) with an unpatterned first layer is provided on the substrate. A protective material application unit (8) applies protective material at least on parts of the provided layer structure for protecting at least the parts of the provided layer structure (6), an ablation unit (12) ablates the unpatterned first layer through the protective material such that the patterned first layer is generated, and the protective material removing unit (15) removes the protective material (9). This allows fabricating a layer structure for, for example, an OLED without necessarily using a technically complex and costly photolithography process. Moreover, ablation debris can be removed with removing the protective material, thereby reducing the probability of unwanted effects like unwanted shortcuts in the OLED caused by unwanted debris.
公开/授权文献
- US20140272326A1 FABRICATION APPARATUS FOR FABRICATING A LAYER STRUCTURE 公开/授权日:2014-09-18