Invention Grant
US09234165B2 Low-VOC cleaning substrates and compositions consisting of a solvent mixture
有权
低VOC清洗底物和由溶剂混合物组成的组合物
- Patent Title: Low-VOC cleaning substrates and compositions consisting of a solvent mixture
- Patent Title (中): 低VOC清洗底物和由溶剂混合物组成的组合物
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Application No.: US14317835Application Date: 2014-06-27
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Publication No.: US09234165B2Publication Date: 2016-01-12
- Inventor: Janiece Hope , Nancy A. Falk , Wenyu Zhang , Jared Heymann , Mona Marie Knock , Mike Kinsinger , Bernard Hill , Vidya Ananth
- Applicant: The Clorox Company
- Applicant Address: US CA Oakland
- Assignee: The Clorox Company
- Current Assignee: The Clorox Company
- Current Assignee Address: US CA Oakland
- Agent Erin Collins
- Main IPC: C11D1/12
- IPC: C11D1/12 ; C11D1/94 ; C11D1/90 ; C11D1/62 ; C11D3/48 ; A47L13/17 ; C11D1/835 ; C11D3/43 ; A01N33/12 ; C11D1/00 ; C11D1/72
Abstract:
A cleaning composition for sanitizing and/or disinfecting hard surfaces, comprising: a cationic biocide, surfactant and low levels of VOC solvents. The cleaning composition is adapted to clean a variety of hard surfaces without leaving behind a visible residue and creates low levels of streaking and filming on the treated surface. The cleaning composition contains less than 5% by weight of VOCs. The cleaning composition may be used alone as a liquid or spray formulation or in combination with a substrate, for example, a pre-loaded cleaning wipe.
Public/Granted literature
- US20150079140A1 LOW-VOC CLEANING SUBSTRATES AND COMPOSITIONS Public/Granted day:2015-03-19
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