发明授权
- 专利标题: Lithographic apparatus and device manufacturing method
- 专利标题(中): 平版印刷设备和器件制造方法
-
申请号: US13149121申请日: 2011-05-31
-
公开(公告)号: US09235113B2公开(公告)日: 2016-01-12
- 发明人: Nicolaas Rudolf Kemper , Sjoerd Nicolaas Lambertus Donders , Joost Jeroen Ottens , Edwin Cornelis Kadijk , Sergei Shulepov
- 申请人: Nicolaas Rudolf Kemper , Sjoerd Nicolaas Lambertus Donders , Joost Jeroen Ottens , Edwin Cornelis Kadijk , Sergei Shulepov
- 申请人地址: NL Veldhoven
- 专利权人: ASML NETHERLANDS B.V.
- 当前专利权人: ASML NETHERLANDS B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Pillsbury Winthrop Shaw Pittman LLP
- 主分类号: G03B27/52
- IPC分类号: G03B27/52 ; G03B27/42 ; G03F7/20
摘要:
Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.
公开/授权文献
- US20110242512A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 公开/授权日:2011-10-06
信息查询