发明授权
- 专利标题： Plasma processing apparatus
- 专利标题（中）： 等离子体处理装置
-
申请号： US13428512申请日： 2012-03-23
-
公开(公告)号： US09236226B2公开(公告)日： 2016-01-12
- 发明人: Jun Yamawaku , Takafumi Kimura , Chishio Koshimizu
- 申请人： Jun Yamawaku , Takafumi Kimura , Chishio Koshimizu
- 申请人地址： JP Tokyo
- 专利权人： TOKYO ELECTRON LIMITED
- 当前专利权人： TOKYO ELECTRON LIMITED
- 当前专利权人地址： JP Tokyo
- 代理机构： Pearne & Gordon LLP
- 优先权： JP2011-067523 20110325
- 主分类号： H01L21/00
- IPC分类号： H01L21/00 ; H01J37/32
摘要：
In the plasma processing apparatus 10, a processing space S is formed between a susceptor 12 and an upper electrode 13 facing the susceptor 12. The plasma processing apparatus 10 includes a magnetic field generating unit provided at a side of the upper electrode 13 opposite to the processing space S. The magnetic field generating unit includes a magnetic force line generating unit 27 having a pair of annular magnet rows 27a and 27b. The annular magnet rows 27a and 27b are provided at the side of the upper electrode 13 opposite to the processing space S and arranged concentrically when viewed from the top. In the magnetic force line generating unit 27, an angle θ1 formed by axial lines of magnets of the annular magnet rows 27a and 27b is set to be in a range of about 0°
公开/授权文献
- US20120241092A1 PLASMA PROCESSING APPARATUS 公开/授权日：2012-09-27
信息查询
IPC分类:
